Synthesis and Photosensitive Characterization of NDAS Derivatives

NDAS 유도체의 합성과 감광특성

  • 이기창 (명지대학교 화학공학과) ;
  • 최성용 (명지대학교 화학공학과) ;
  • 배남경 (명지대학교 화학공학과) ;
  • 윤철훈 (명지대학교 화학공학과) ;
  • 황성규 (명지대학교 화학공학과)
  • Published : 1996.11.30


Naphthoquinone-1,2-diazide-5-sulfonyl[NDAS] derivatives members of quinone diazide compound that are utilizable as photosensitive polymer material were synthesized, and photoresist were prepared by mixing these derivatives with m-cresol novolak(a matrix resin) at various weight ratios. Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process. Experimental results showed that, by UV, NDAS derivatives were photoconverted and developer-soluble photoresist were produced. The mixing ratio of 1:4(by mass) of NDAS+p-ydroxybenzophenone+sensitizer and m-cresol novolak gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast.