Analysis of Organic Impurities in Terephthalic Acid Manufacturing Process

테레프탈산 제조공정 중의 유기불순물 분석

  • Kim, Dong Bum (Petrochemical Research Center, Sunkyong Industries) ;
  • Cha, Woonou (Petrochemical Research Center, Sunkyong Industries) ;
  • Kwak, Kyu Dae (Petrochemical Research Center, Sunkyong Industries)
  • 김동범 (선경인더스트리 섬유화학연구소) ;
  • 차운오 (선경인더스트리 섬유화학연구소) ;
  • 곽규대 (선경인더스트리 섬유화학연구소)
  • Received : 1996.09.04
  • Accepted : 1996.11.16
  • Published : 1996.12.10


The organic impurities are formed in the p-xylene oxidation process to terephthalic acid(TPA) and they are present in the filtrate(mother liquor) solution or the TPA particles. The organic impurities present in the p-xylene oxidation are formed through side reactions or incomplete reaction. In this study, the main organic impurities, such as benzoic acid, p-toluic acid, p-tolualdehyde, 4-carboxybenzaldehyde, phthalic acid, isophthalic acid, trimellitic acid, and 4-hydroxymethyl benzoic acid were identified simultaneously by gas chromatograghy. The above impurities were reacted with bis(trimethylsilyl)trifluoroacetamide in the mixture of internal standard solution and pyridine solution by trimethylsilylation, where the internal standard solution was made by 99% bis (trimethylsilyl)trifluoroacetamide and 1% trimethylchlorosilane. The main organic impurities above mentioned can be analyzed quantitatively within 50 min.



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