The influences of laser-induced damage threshold by the post-processing of $Al_2O_3$ thin films

$Al_2O_3$ 박막의 후처리 효과가 Laser-Induced Damage Threshold에 미치는 영향

  • 유연석 (청주대학교 광학공학과) ;
  • 이성훈 (청주대학교 광학공학과)
  • Published : 1997.10.01

Abstract

The influences of laser-induced damage threshold by the after-processing of $Al_2O_3$ thin films was investigated. The samples were fabricated at the substrate temperature of $100^{\circ}C$, $200^{\circ}C$, $300^{\circ}C$ and $350^{\circ}C$ respectively, and the LIDT were measured by using Nd:YAG laser. After the processing with baking and laser conditioning of the samples, the variation of LIDT was measured. It was found that LIDT was enhanced twice by laser-conditioning process and 1.5 times by baking process. In addition, we measured the chemical properties of the thin film structure before and after the processing by using XPS.

Keywords

References

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