Solubility Comparison by Yield Method of Residual of Photoresist for Printing Plate

인쇄 제판용 Photoresist의 잔막수율법에 의한 용해도 비교

  • 윤철훈 (명지대학교 화학공학과) ;
  • 황성규 (명지대학교 화학공학과) ;
  • 오세영 (명지대학교 화학공학과) ;
  • 최성용 (명지대학교 화학공학과) ;
  • 이기창 (명지대학교 화학공학과)
  • Published : 1998.03.31


Photoresist is defined as substance that makes chemical changes in its solubility, colouring and hardening by light energy. In this study, photosensitive photoresists of the positive type for a printing plate were studied. PF, o-, m-, p-CF resins as a matrix resin were synthesized at an identical condition. Photoresists were prepared by mixing NDS derivatives with a matrix resin at various mixing ratios. Characteristics of photoresists were studied by yield method of residual using solubility and Optical microscope was also analyzed. Prepared photoresist using NDS derivatives shows excellent photosensitivity and solubility compared with commercial product. The mixing ratio of 1:4(by mass) of NDS derivative[III] and m-CF resin shows the highest dissoultion rate among others. In addition, photoresist was obtained at this condition resulted in the superior sensitivity and contrast.