DOI QR코드

DOI QR Code

The Study on the CMP of Transparent Conductive ITO Thin Films for the Organic Electro-Luminescence Display

유기 전계 발광 디스플레이용 ITO 투명 전도성 박막의 CMP에 관한 연구

  • Jo, Seong-Hwan (Dept.of Mechanical Engineering, Busan National University) ;
  • Kim, Hyeong-Jae (Dept.of Precision Mechanical Engineering, Graduate School of Busan National University) ;
  • Kim, Gyeong-Jun (Dept.of Precision Mechanical Engineering, Graduate School of Busan National University) ;
  • Jeong, Hae-Do
  • 조성환 (부산대학교 대학원 정밀기계공학과) ;
  • 김형재 (부산대학교 대학원 정밀기계공학과) ;
  • 김경준 (부산대학교 대학원 정밀기계공학과) ;
  • 정해도 (부산대학교 대학원 정밀기계공학과)
  • Published : 2002.05.01

Abstract

The purpose of this paper is that the roughness(Rrms = 31$\AA$, Rp-v = 270$\AA$) of ITO thin film deposited by sputtering method for OELD is improved to Rrms $\leq$ 10$\AA$, Rp-v $\leq$ 80$\AA$ by chemical mechanical polishing(CMP). First, ITO thin films are polished with a variety of consumables (Pads, Slurries) to choose proper some for the roughness improvement and the CMP mechanism of ITO thin films is demonstrated on the ground of the experiment results. Henceforth, the CMP characteristics (Removal rate, Non-uniformity) of chosen consumables are evaluated according to processing conditions (Polishing pressures, Table velocities) and suitable conditions for ITO film CMP are selected. Finally, the electrical and optical properties (Sheet resistance, Transmittance) of ITO thin films are investigated to verify whether or not ITO thin film are still suitable for OELD after polished.

Keywords

CMP;ITO(Indium-Tin Oxide);IZO(Indium-Zinc Oxide);OELD;ILD

References

  1. Hawley, 1987, 'Condensed Chemical Dictionary,' Van Hos Reinhold, Vol. 1, pp. 635-1089
  2. Baca Raton, Robert C, 1988, 'Handbook of Chemical and Physics,' CRC Press, 1st Student Edition, pp. B.1-B.74
  3. Hyoung Jae Kim, Hae Do Jeong, Eung Suk Lee, Young Jae Shin, 2001, 'Measurement of Wafer Scale Temperature Distribution in Chemical Mechanical Polishing,' Advances in Abrasive TechnologyVI, KAME, pp. 279-284
  4. Baca Raton, 1987, Handbook of Chemical and Physics,' CRC Press, pp. 3.1-9.23
  5. M. Tomozawa, 1997.07, Oxide CMP Mechanims,' Solid State Technology, p. 171
  6. 이의호, 1999, '부식과 방식의 원리,' 동화기술사, pp. 15-100
  7. Hsinchu, 1999, 'Investigation of CMP Micro-scrach in the Fabrication of Sub-Quarter Micro VSI Circuits,' CMP-MIC Conference, pp. 77-79
  8. Shin Hwa Li, Robert O. Millier, 2000, 'Chemical Mechanical Polishing in Silicon Processing,' Vol. 63, pp. 89-92
  9. M. Cook, 1990, 'Chemical Processing in Glass Polishing,' Journal of Non-Crystalline Solids, Vol. 120, pp. 152-171 https://doi.org/10.1016/0022-3093(90)90200-6
  10. 박종관, 오대성, 1998, '반응성 스퍼터링으로 증착한 ITO박막의 전기적, 광학적 성질,' 과학기술논문집, Vol. 9, No. 2, pp. 809-823
  11. 최규만, 1994, 'ITO 투명전극의 제조 및 그 특성,' 관대논문집, Vol. 1994, No. 2, pp. 113-121
  12. 황효정, 1999, '반도체 공정 기술,' 생능출판사, pp. 45-80
  13. 허창우, 2000, '스프터링 진공 증착 장비를 이용한 투명도전 박막 개발,' 목원대학교논문집, Vol 38, No. 1, pp. 225-266
  14. Kentaro Utsumi, Osamu Matsunoga, Tsutomu Takahata, 1998, 'Low Resistivity ITO Film Prepared Using the Ultra High Density ITO Target,' Thin Solid Films, Vol. 334, pp. 30-34 https://doi.org/10.1016/S0040-6090(98)01111-0
  15. 황인철, 김석범, 1999, 'ITO 투명도전막의 제조 조건에 따른 특성 변화,' 산업기술종합연구소 논문집, Vol. 17, pp. 395-401
  16. 윤병삼, 2001.02, '특허로 본 유기 EL 소자 (II),' 월간 반도체, pp. 95-102
  17. 정호균, 권장혁, 2001.05, '유기 ELD의 개요 및 연구 동향,' 기계저널, Vol. 41, No. 5, pp. 47-52
  18. 노봉규외 17인, 2000, 'LCD ENGINEERING, 성안당, pp. 354-362
  19. 이창희, 2001.09, '유기 반도체를 이용한 전기발광 디스플레이,' 월간 반도체, No. 163, pp. 103-109
  20. 김영관, 2001.08, '유기 EL 디스플레이의 현황과 전망,' 월간 반도체, No. 162, pp. 97-100
  21. 장진, 2001.05, '평판 디스플레이의 현황과 전망,' 기계저널, Vol. 41, No. 5, pp. 30-36