The Study on the CMP of Transparent Conductive ITO Thin Films for the Organic Electro-Luminescence Display

유기 전계 발광 디스플레이용 ITO 투명 전도성 박막의 CMP에 관한 연구

  • Jo, Seong-Hwan (Dept.of Mechanical Engineering, Busan National University) ;
  • Kim, Hyeong-Jae (Dept.of Precision Mechanical Engineering, Graduate School of Busan National University) ;
  • Kim, Gyeong-Jun (Dept.of Precision Mechanical Engineering, Graduate School of Busan National University) ;
  • Jeong, Hae-Do
  • 조성환 (부산대학교 대학원 정밀기계공학과) ;
  • 김형재 (부산대학교 대학원 정밀기계공학과) ;
  • 김경준 (부산대학교 대학원 정밀기계공학과) ;
  • 정해도 (부산대학교 대학원 정밀기계공학과)
  • Published : 2002.05.01


The purpose of this paper is that the roughness(Rrms = 31$\AA$, Rp-v = 270$\AA$) of ITO thin film deposited by sputtering method for OELD is improved to Rrms $\leq$ 10$\AA$, Rp-v $\leq$ 80$\AA$ by chemical mechanical polishing(CMP). First, ITO thin films are polished with a variety of consumables (Pads, Slurries) to choose proper some for the roughness improvement and the CMP mechanism of ITO thin films is demonstrated on the ground of the experiment results. Henceforth, the CMP characteristics (Removal rate, Non-uniformity) of chosen consumables are evaluated according to processing conditions (Polishing pressures, Table velocities) and suitable conditions for ITO film CMP are selected. Finally, the electrical and optical properties (Sheet resistance, Transmittance) of ITO thin films are investigated to verify whether or not ITO thin film are still suitable for OELD after polished.


CMP;ITO(Indium-Tin Oxide);IZO(Indium-Zinc Oxide);OELD;ILD


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