# 임플란트 매식 시 수직골 높이에 따른 응력분석

• Kim, Min-Ho (Department of Prosthodontics, College of Dentistry, Chosun University) ;
• Park, Young-Rok (Department of Prosthodontics, College of Dentistry, Chosun University) ;
• Kay, Kee-Sung (Department of Prosthodontics, College of Dentistry, Chosun University)
• 김민호 (조선대학교 치과대학 보철학교실) ;
• 박영록 (조선대학교 치과대학 보철학교실) ;
• 계기성 (조선대학교 치과대학 보철학교실)
• Published : 2002.12.30

#### Abstract

The purpose of this study was to compare the distributing pattern of stress on the finite element models with the different vertical bone level of implant fixture. The two kinds of finite element models were designed according to vertical bone level around fixture ($4.0mm{\times}11.5mm$). The cemented crowns for mandibular first and second molars were made. Three- dimensional finite element model was created with the components of the implant and surrounding bone. Vertical loads were applied with force of 200N distributed within 0.5mm radius circle from the center of central fossa and distance 2mm and 4 mm apart from the center of central fossa. Von-Mises stresses were recorded and compared in the supporting bone, fixtures, abutment screws, and crown. The results were as following : (1) In vertical loading at the center circle of central fossa on model 1 and 2, the difference from vertical bone in implant placement did not affect the stress pattern on all components of implant except for crown. (2) With offset distance incerasing and the bone level of implant decreasing, the concentration of stress occured in the buccal side of long crown, around the buccal crestal bone, and on the fixture- abutment interface. As a conclusion, the research showed a tendency to increase the stress on the supporting bone, fixture and screw under the offset loads when the vertical level of bone around fixture was different. Since the same vertical bone bed has more benefits than the different bone bed around fixtures, it is important to prepare a same vertical level of bone bed for the success of implants under occlusal loads.