DOI QR코드

DOI QR Code

The Structural Properties Of the (Ba1Sr)(Nb1Ti)O3[BSNT] Thin Films with Ar/O2Ratios

Ar/O2비에 따른 (Ba1Sr)(Nb1Ti)O3[BSNT] 박막의 구조적 특성

  • 남성필 (광운대학교 전자재료공학과) ;
  • 이상철 (광운대학교 전자재료공학과) ;
  • 이영희 (광운대학교 전자재료공학과) ;
  • 이성갑 (서남대학교 전기전자멀티미디어공학부)
  • Published : 2003.04.01

Abstract

In this study, the structural properties were Investigated for the deposited (Ba,Sr)(Nb,Ti)O$_3$[BSNT] thin films grown on Pt/TiO$_2$/SiO$_2$/Si substrate by RF sputtering method. The structural properties of the BSNT thin films affected by the Ar/02 ratios were Investigated. In the case of the BSNT thin films deposited with condition of 60/40(Ar/O$_2$) ratio, the BaTiO$_3$, SrTiO$_3$ and BaNbO$_3$ phases were showed. The composition ratio of Nb and Ti in the BSNT thin films were nearly equivalent. Also, in the BSNT thin films deposited with condition of 60/40 and 80/20(Ar/O$_2$) ratios, the composition of Ba, Sr, Nb and Ti were relatively uniform. The Ba, Sr, Nb and Ti in the BSTN thin films were not diffused into the Pt layer.

Keywords

(Ba,Sr)(Nb,Ti)$O_3$ thin films;Ar/$O_2$ratio;Structural properties

References

  1. 한국전기전자재료학회지 v.12 Ar/O₂비에 따른 BST 박막의 전기적 특성 신승창;이문기;정장호;배선기;이영희
  2. Proceedings of the IEEE v.77 no.3 Memory cell, and technology issues for 64- and 256-Mbit one-transistor cell MOS DRAMs A. F. Tasch Jr;L. H. Parker
  3. 한국전기전자재료학회 1999 춘계학술대회논문집 기판온도에 따른 $(Ba,Sr)TiO_3$ 박막의 구조적 특성 이상철;임성수;정장호;배선기;이영희
  4. IEEE Circuit and Devices Magazine Fundamental iimitations on DRAM storage capacitors W. P. Noble;K. Wakino;K. Minai
  5. Ber. Dt. Keram. Ges. v.55 no.7 Ceramics and dielectric properties of selected compositions in the $BaO-TiO_2-Nd_2O_3$ system T. Jaakola;G. Wilson
  6. Information writing mechanism in thin film MFIS structures, ferroelectrics v.143 L. Baginsky;E. G. Kostov https://doi.org/10.1080/00150199308008335
  7. Ferroelectrics v.143 Information writing mechanism in thin film MFIS stuctures L. Baginsky;E. G. Kostov
  8. Proc. 4th ISIF Electrical characteristics of high dielectric constant materials for integrated ferroelectrics M. Azuma;O Renoult
  9. 한국전기전자재료학회지 v.12 RF sputtering을 이용한 차세대 유전체 박막용 $BaTiO_3$ 세라믹스 박막의 제조 및 전기적 특성에 관한 연구 류기원;정장호;이문기;이영희