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Fabrication of a PDMS (Poly-Dimethylsiloxane) Stamp Using Nano-Replication Printing Process

나노 복화(複畵)공정을 이용한 PDMS 스탬프 제작

  • 박상후 (한국과학기술원 대학원 기계공학과) ;
  • 임태우 (한국과학기술원 대학원 기계공학) ;
  • 양동열 (한국과학기술원 기계공학과) ;
  • 공홍진 (한국과학기술원 물리학)
  • Published : 2004.07.01

Abstract

A new stamp fabrication technique for the soft lithography has been developed in the range of several microns by means of a nano-replication printing (nRP) process. In the nRP process, a figure or a pattern can be replicated directly from a two-tone bitmap figure with nano-scale details. A photopolymerizable resin was polymerized by the two-photon absorption which was induced by a femtosecond laser. After the polymerization of master patterns, a gold metal layer (about 30 ㎚ thickness) was deposited on the fabricated master patterns for the purpose of preventing a join between the patterns and the PDMS, then the master patterns were transferred in order to fabricate a stamp by using the PDMS (poly-dimethylsiloxane). In the transferring process, a few of gold particles, which were isolated from the master patterns, remained on the PDMS stamp. A gold selective etchant, the potassium iodine (KI) was employed to remove the needless gold particles without any damage to the PDMS stamp. Through this work, the effectiveness of the nRP process with the PDMS molding was evaluated to make the PDMS stamp with the resolution of around 200 ㎚.

Keywords

Nano-Replication Printing Process(nRP);Two-Photon Polymerization;Stamp;Femtosecond Laser

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