Trace impurities analysis of the electronic polymer resins by neutron activation analysis

중성자방사화분석법에 의한 전자소재용 고분자수지의 불순물 분석법연구

  • Yoon, Yoon Yeol (Groundwater & Geothermal Division, Korea Institute of Geoscience & Mineral Resources) ;
  • Cho, Soo Young (Groundwater & Geothermal Division, Korea Institute of Geoscience & Mineral Resources) ;
  • Lee, Kil Yong (Groundwater & Geothermal Division, Korea Institute of Geoscience & Mineral Resources) ;
  • Yang, Myung Kwon (Groundwater & Geothermal Division, Korea Institute of Geoscience & Mineral Resources) ;
  • Shim, Sang Kwon (Groundwater & Geothermal Division, Korea Institute of Geoscience & Mineral Resources) ;
  • Chung, Yong Sam (HANARO Utilization Team, Korea Atomic Energy Research Institute)
  • 윤윤열 (한국지질자원연구원, 지하수지열연구부) ;
  • 조수영 (한국지질자원연구원, 지하수지열연구부) ;
  • 이길용 (한국지질자원연구원, 지하수지열연구부) ;
  • 양명권 (한국지질자원연구원, 지하수지열연구부) ;
  • 심상권 (한국지질자원연구원, 지하수지열연구부) ;
  • 정용삼 (한국원자력연구소 하나로 이용연구팀)
  • Received : 2004.06.10
  • Accepted : 2004.07.16
  • Published : 2004.08.25

Abstract

When the polymer was used for the guard raw materials of electronic device, the content of U, Th and their daughter nuclides were known as a factor of soft error. Because emitted alpha ray could be caused of mis-operation. And ionic impurities such as Cl, Fe, Na could shorten the device life-time. For the analysis of trace impurities in the polymer, neutron activation analysis(NAA) and ICP/AES have been studied. To improve the accuracy and sensitivity of the trace and ultratrace metallic impurities in the epoxy and phenol polymer, sample pretreatment method and optimum analytical condition of NAA were developed. Using the above method, U, Th and other 23 trace impurity elements were analyzed.

Keywords

neutron activation analysis;epoxy;phenol;trace impurity analysis

References

  1. R. Caletka, R. Hausbek, V. Krivan, J. Radioanal. Nucl. Chem., 120 319-327 (1988).
  2. IAEA-TECDOC-564, Practical Aspects of Operating a NAA Laboratory, IAEA, Vienna, 20-33, 1990.
  3. M. Kobayashi, J. Poly. Sci., 17 293-297(1979).
  4. A. Hegazy, T. Seguchi, K. Arakawa, S. Machi, J. Appli. Poly. Sci., 26 1361-1372(1981).
  5. K.Y. Lee, S.K. Shim, Y.Y. Yeol, Y.S. Chung, G.H. Lee, J. Radioanal. Nucl. Chem., 241 129-134(1999).
  6. P. Bode, J. Radioanal. Nucl. Chem., 167 361-367(1993).
  7. Japan Analytical Science Society, 'Handbook of Polymer Analysis', 106, 1985.
  8. K.D. Ranor, J. Luszkyt, K.U. Ingold, J. Org. Chem., 53 5220-5225(1988).
  9. S.J. Parry, 'Activation Spectrometry in Chemical Analysis', vol 119, 196-209, J.D. Winefordner ed. John Wiley and Sons, Inc., New York 1991.
  10. G.E. Aardsma, P. Jagam, J.J. Simpson, J. Radioanal. Nucl. Chem., 111 111-116(1987).
  11. E.L. Henn, Anal. Chim. Acta, 73 273-281(1974).
  12. K.Y. Lee, S.K. Shim, M.K. Yang, J.T. Park, S.Y. Kim, S.Y. Cho, S.Y. Yang, S.S. Seo, 'Study of standard analytical method for the analysis of trace impurities in the silica fine particle for EMC', MOCIE, 2003.
  13. K.Y. Lee, S.K. Shim, Y.Y. Yeol, M.K. Yang, 'Development of the precise method for plastic materials by the use of NAA', KAERI/CM 374/99, KAERI 2000.
  14. B. Ranby, J.F. Rabek, 'ESR spectroscopy in polymer research', 260, Springer Verlag, New York, 1977.
  15. M. Takenaka, Y. Yamada, M. Hayashi, H. Endo, Anal. Chim. Acta, 336 151-156(1996).
  16. E.W. Haas, H. Schnabel, R. Hofmann, J. Radioanal. Nucl. Chem., 168 403-412(1993).
  17. T.S. Dunn, B.J. Epperson, H.W. Sugg, V.T. Stannet, J.L. Williams, Radi. Phys. Chem., 14 625-634(1979).
  18. S.Y. Yang, Korea Semiconductor Co. Ltd, private communication.