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Photoresist spray coating for three-dimensional micro structure

3차원 마이크로 구조를 위한 포토레지스트 스프레이 코팅

  • Kim, Do-Wook (School of Electrical Engineering and Computer Science, Kyungpook National Univ.) ;
  • Eun, Duk-Su (School of Electrical Engineering and Computer Science, Kyungpook National Univ.) ;
  • Bae, Young-Ho (Department of Electronics, Uiduk Univ.) ;
  • Yu, In-Sik (Department of Mobile Information Communication, Kyungdong College of Techno-information) ;
  • Suk, Chang-Gil (Ultech. Co., Ltd.) ;
  • Jeong, Jong-Hyun (School of Electrical Engineering and Computer Science, Kyungpook National Univ.) ;
  • Cho, Chan-Seop (Department of Electronics, Sangju National Uinv.) ;
  • Lee, Jong-Hyun (School of Electrical Engineering and Computer Science, Kyungpook National Univ.)
  • 김도욱 (경북대학교 전자전기컴퓨터학부) ;
  • 은덕수 (경북대학교 전자전기컴퓨터학부) ;
  • 배영호 (위덕대학교 전자공학과) ;
  • 유인식 (경동정보대학 모바일 정보통신과) ;
  • 석창길 (㈜울텍) ;
  • 정종현 (경북대학교 전자전기컴퓨터학부) ;
  • 조찬섭 (상주대학교 전자공학과) ;
  • 이종현 (경북대학교 전자전기컴퓨터학부)
  • Published : 2006.05.31

Abstract

This paper presents the method for three-dimensional micro structure with photoresist spray coating system. The system consists of a high temperature rotational chuck, ultrasonic spray nozzle module, angle control module and nozzle moving module. Spray coating system is effected by several parameters such as the solid contents, the dispensed volume, the scanning speed of the spray nozzle and the wafer of dimension. The photoresist (AZ 1512) has been coated on the three-dimensional micro structure by spray coating system and the characteristics have been evaluated.

References

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