Hydrogen Absorption Characteristics of Al/Pd Film

Al/Pd 박막의 수소 흡수 특성

  • Cho, Young-Sin (Dept of Science Education Kangwon National University)
  • 조영신 (강원대학교 과학교육학부)
  • Published : 2006.06.15


Al film(135.5 nm thick) with Pd film(39.6 nm thick) on the top of it was made by thermal evaporation method. Hydrogen absorption of Al/Pd film was measured by quartz crystal microbalance(QCM) method at room temperature. The sample was activated by hydrogen absorption and desorption cycling at room temperature. Hydrogen was introduced into the film by increasing hydrogen gas pressure step by step up to 640 torr at room temperature. Hydrogen concentration reached up to 25% at $5{\sim}10$ torr. But at high pressure the concentration decreased. This strange tendency was not understood yet. Further study is needed to find out the mechanism of hydrogen absorption in Al in Al/Pd film.


Quartz Crystal Microbalance;Film;Hydrogen absorption;desorption;Activation


  1. F. A. Lewis, The Palladium Hydrogen System, Academic Press, London and New York, 1967
  2. 조영신, 'PdHx 박막의 광투과도', 수소에너지, Vol. 12, No.3, 2001, pp. 201-209
  3. C. Nylander, M. Anngarth, and C. Svensson, 'Hydrogen induced drift in palladium gate metal-oxide-semiconductor structure', J. Appl. Phys. Vol. 56, No. 4, 1984, pp. 1177-1188 https://doi.org/10.1063/1.334046
  4. D. E. Azofeifa and N. Clark, 'Hall coefficient and resistivity of hydrogenated Pd in thin films', Zeitschrift fur Phys. Chem. NF, Bd. 163, 1989, pp. 621-626 https://doi.org/10.1524/zpch.1989.163.Part_2.0621
  5. Young-sin Cho, J. S. Lee and C. W. Kim, 'The hydrogen absorption kinetics in very thin Pd film(a phase)', 수소에너지, Vol. 9, No.1, 1998, pp. 25-30
  6. D. E. Azofeifa, N. Clark, A. Amador and A. Saenz, 'Determination of hydrogen absorption in Pd coated Al thin films', Thin Solid Film, Vol. 300, No. 1-2, 1997, pp. 295-298 https://doi.org/10.1016/S0040-6090(96)09493-X
  7. 김길환, 수소에너지, 현대과학신서 113, 전파과학사, 1981
  8. J. Volkl and G. Aleford, Topics in Applied Physics, G. Alefe1d and J. Volkl ed., Springer, New York, Vo1 28, 1978
  9. J. Volkl and G. Aleford, Topics in Applied Physics, G. Alefeld and J. Volkl ed., Springer, New York, Vol 29, 1978