An Ellipsometry Study of Water Absorption in the 193 nm photoresist

Ellipsometry를 이용한 193 nm photoresist에서의 물의 흡수 연구

  • Lee, Hyoung-Joo (Department of Applied Physics, Hanyang University) ;
  • Lee, Jung-Hwan (Department of Applied Physics, Hanyang University) ;
  • Seo, Ju-Bin (Department of Applied Physics, Hanyang University) ;
  • Kyoung, Jai-Sun (Department of Applied Physics, Hanyang University) ;
  • An, Il-Sin (Department of Applied Physics, Hanyang University)
  • 이형주 (한양대학교 응용물리학과) ;
  • 이정환 (한양대학교 응용물리학과) ;
  • 서주빈 (한양대학교 응용물리학과) ;
  • 경재선 (한양대학교 응용물리학과) ;
  • 안일신 (한양대학교 응용물리학과)
  • Published : 2006.06.30

Abstract

We employed in-situ spectroscopic ellipsometry(SE) and imaging ellipsometry(IE) to study the interaction of water and photoresist(PR) in 193 immersion lithography. Real time measurement of SE showed thickness increase when PR was immerged in water indicating swelling effect. From the temporal evolution we could observe its reaction-limited behavior. Meanwhile, IE could identify the modification of PR surface by contact of water even for a short period of a second.