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Fabrication of Nickel Nano and Microstructures by Redeposition Phenomena in Ion Etching Process

이온식각공정의 재증착 현상을 이용한 니켈 마이크로 나노 구조물 제작

  • 정필구 (부산대학교 기계공학부) ;
  • 황성진 (부산대학교 기계공학부) ;
  • 이상민 (부산대학교 미세기계전자시스템협동과정) ;
  • 고종수 (부산대학교 기계공학부)
  • Published : 2007.01.01

Abstract

Nickel nano and microstructures are fabricated with simple process. The fabrication process consists of nickel deposition, lithography, nickel ion etching and plasma ashing. Well-aligned nickel nanowalls and nickel self-encapsulated microchannels were fabricated. We found that the ion etching condition as a key fabrication process of nickel nanowalls and self-encapsulated microchannels, i.e., 40 sccm Ar flow, 550 W RF power, 15 mTorr working pressure, and $20^{\circ}C$ water cooled platen without using He backside cooling unit and with using it, respectively. We present the experimental results and discuss the formational conditions and the effect of nickel redeposition on the fabrication of nickel nano and microstructures.

Keywords

Nickel;Nanowall;Microchannel;Ion Etching;Redeposition

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