A Study of The Photosensitive Characteristic and Fabrication of Polyimide Thin Film by Dry Processing

건식법을 이용한 폴리이미드 박막의 제조 및 광특성

  • 이붕주 (인하대학교 전자전기공학부)
  • Published : 2007.01.01

Abstract

Thin films of polyimide (Pl) were fabricated by a vapor deposition polymerization method (VDPM) and studied for the photosensitive characteristic. Polyamic acid (PAA) thin films fabricated by vapor deposition polymerization (VDP) from 6FDA and 4-4' DDE were converted to PI thin films by thermal curing. From AFM and Ellipsometer experimental, the films thickness was decreased and the reflectance was increased as the curing temperature was increased. Those results implies that thin film is uniform. From UV-Vis spectra, PI thin films showed high absorbance in 225 $\sim$ 260 [nm] region.

References

  1. A M. Wilson, 'Polyimides: Synthesis, Characterization and Applications', ed. by K L. Mittal, vol. II, p.715, Plenum, New York and London, 1980
  2. 飯島正行,高橋善和,稲川手之助,安藤昭夫,'員空中で芳 香族ポリイドの合成', 員空, 28(5), pp. 437-439 (1985)
  3. J. R. Salem, F. O. Segueda, J. Duran, W. T. Lee, R. M Yang, J.VacSci.Technol., A4(3), pp. 369-374 (1986)
  4. C.A. Pryde, J. polymer. Sci., A27, p. 711 (1989)
  5. K.H.Guenther and H.K.Pulker, Appl. Opt, 15, 2992(1976)
  6. K. L. Mittal, 'Polyimides, Synthesis, Characterization, and Applications', pp.695-711. Plenum Press, New York, 1984
  7. H.G. Kim and D. C. Lee, J.Kieeme, 9(8), 776 (1996)