Atmospheric Photochemistry in Low-and High-NOx Regimes



Kim, Do-Yong;Soda, Satoshi;Kendo, Akira;Oh, Jai-Ho

  • 발행 : 2007.01.31


Atmospheric photochemistry of $O_3-NOx-RH$ were considered theoretically, to clarify the reasons for the different trends of between the formation of photochemical oxidants (Ox) and its primary pollutants for the Low-and High-NOx regimes. Equations of OH, $HO_2$, and production of ozone ($O_3$) as a function of nitrogen oxides (NOx) and reactive hydrocarbons (RH) were represented in this study. For the Low-NOx regime, $HO_2$ radical is proportional to RH but independent of NOx. OH radical is proportional to NOx but inversely-proportional to RH. $O_3$ production is proportional to NOx but has a weak dependence on RH. For the High-NOx regime, OH and $HO_2$ radicals concentrations and $O_3$ production are proportional to RH but inversely-proportional to NOx. In addition, the Osaka Bay and surrounding areas of Japan were evaluated with the mass balance of odd-hydrogen radicals (Odd-H) using CBM-IV photochemical mechanism, in order to distinguish the Low- and High-NOx regimes. The Harima area (emission ratio, RH/NOx = 6.1) was classified to the Low-NOx regime. The Hanshin area (RH/NOx = 3.5) and Osaka area (RH/NOx = 4.3) were classified to the High-NOx regime.


Photochemical oxidants (Ox);Nitrogen oxides (NOx);Reactive hydrocarbons (RH);Low-NOx regime;High-NOx regime


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