Reclamation of High Purity Organic Solvents from Waste Photoresist Stripper

포토레지스트 스트리퍼 폐액으로부터 고순도 유기용제 회수

  • Kim, Dae-Jin (Department of Chemical and Biomolecular Engineering and Interdisciplinary Program of Integrated Biotechnology, Sogang University) ;
  • Oh, Han-Sang (Department of Chemical and Biomolecular Engineering and Interdisciplinary Program of Integrated Biotechnology, Sogang University) ;
  • Kim, Jae-Kyeong (Department of Chemical and Biomolecular Engineering and Interdisciplinary Program of Integrated Biotechnology, Sogang University) ;
  • Park, Myeong-Jun (Korex Co.) ;
  • Lee, Moon-Yong (School of Display and Chemical Engineering, Yeungnam University) ;
  • Koo, Kee-Kahb (Department of Chemical and Biomolecular Engineering and Interdisciplinary Program of Integrated Biotechnology, Sogang University)
  • 김대진 (서강대학교 화공생명공학과 및 바이오융합기술과정) ;
  • 오한상 (서강대학교 화공생명공학과 및 바이오융합기술과정) ;
  • 김재경 (서강대학교 화공생명공학과 및 바이오융합기술과정) ;
  • 박명준 ((주)코렉스) ;
  • 이문용 (영남대학교 디스플레이화학공학부) ;
  • 구기갑 (서강대학교 화공생명공학과 및 바이오융합기술과정)
  • Published : 2007.12.31

Abstract

As a basic study for the development of pilot-scale distillation process of waste photoresist strippers from semiconductor industry, lab-scale experiments for the recovery of NMP (N-methy1-pyrrolidione) and BDG (Butyldiglycol) from waste photoresist strippers have been made using a spinning band vacuum distillation column. Purities of NMP and BDG obtained from the present experiments were higher than 99.5%. Furthermore, water content was less than 1000 ppm, color grade(APHA) less than 50, most metal contents except sodium less than 1 ppb. Those results indicate that NMP and BDG reclamed by distillation satisfy the their specifications required for the formulation of new photoresist strippers. Recovery rate of NMP and BDG was 96 and 53%, respectively, for type A, and 93 and 57%, respectively, for type B waste PR stripper solution.