A Study on the Ablation of AZ5214 and SU-8 Photoresist Processed by 355nm UV Laser

355nm UV 레이저를 이용한 AZ5214와 SU-8 포토레지스트 어블레이션에 관한 연구

  • Oh, J.Y. (Graduate School, Pusan National University) ;
  • Shin, B.S. (ERC/NSDM, Pusan National University) ;
  • Kim, H.S. (Institutue for Advanced Engineering)
  • 오재용 (부산대학교 대학원) ;
  • 신보성 (부산대학교 정밀정형 및 금형가공연구소) ;
  • 김호상 (고등기술연구원)
  • Published : 2007.06.30

Abstract

We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with $F-{\theta}$ lens. AZ5214 and SU-8 photoresist are chosen as experimental materials and a kind of well-known positive and negative photoresist respectively. Laser ablation mechanism depends on the optical properties of polymer. In this paper, therefore we investigate the phenomenon of laser ablation according to the laser fluence variation and measure the shape profile of micro patterned holes. From these experimental results, we show that LDWL is very useful to process various micro patterns directly.