# 광파장 이하의 주기를 갖는 다결정 실리콘 격자 기반의 컬러필터

• Yoon, Yeo-Taek (Department of Electronic Engineering, Kwangwoon University) ;
• Lee, Hong-Shik (Department of Electronic Engineering, Kwangwoon University) ;
• Lee, Sang-Shin (Department of Electronic Engineering, Kwangwoon University) ;
• Kim, Sang-Hoon (Devices and Materials Lab., LG Electronics Institute of Technology) ;
• Park, Joo-Do (Devices and Materials Lab., LG Electronics Institute of Technology) ;
• Lee, Ki-Dong (Devices and Materials Lab., LG Electronics Institute of Technology)
• 윤여택 (광운대학교 전자공학과) ;
• 이홍식 (광운대학교 전자공학과) ;
• 이상신 (광운대학교 전자공학과) ;
• 김상훈 (엘지전자기술원 소자재료연구소) ;
• 박주도 (엘지전자기술원 소자재료연구소) ;
• 이기동 (엘지전자기술원 소자재료연구소)
• Published : 2008.02.29

#### Abstract

A color filter was proposed and demonstrated by incorporating a subwavelength patterned 1-dimensional grating in poly silicon. It was produced by employing the laser interference lithography method, providing much wider effective area compared to the conventional e-beam lithography. A $SiO_2$ layer was introduced on top of the silicon grating layer as a mask for the etching of the silicon, facilitating the etching of the silicon layer. It was theoretically found that the selectivity of the filter was also improved thanks to the oxide layer. The parameters for the designed device include the grating pitch of 450 nm, the grating height of 100 nm and the oxide-layer height of 200 nm. As for the fabricated filter, the spectral pass band corresponded to the blue color centered at 470 nm and the peak transmission was about 40%. Within the effective area of $3{\times}3mm^2$, the variation in the relative transmission efficiency and in the center wavelength was less than 10% and 2 nm respectively. Finally, the influence of the angle of the incident beam upon the transfer characteristics of the device was investigated in terms of the rate of the relative transmission efficiency, which was found to be equivalent to 1.5%/degree.

#### References

1. F.-J. Ko and H.-P. D. Shieh, 'High-efficiency micro-optical color filter for liquid-crystal projection system applications,' Appl. Opt., vol. 39, no. 7, pp. 1159-1163, 2000 https://doi.org/10.1364/AO.39.001159
2. Y. Cho, Y. K. Choi, and S. H. Sohn, 'Optical properties of neodymium-containing polymethylmethacrylate films for the organic light emitting diode color filter,' Appl. Phys. Lett., vol. 89, pp. 051102-1-051102-3, 2006 https://doi.org/10.1063/1.2244042
3. P. B. Catrysse, W. Suh, S. Fan, and M. Peeters, 'One-mode model for patterned metal layers inside integrated color pixels,' Opt. Lett., vol. 29, no. 9, pp. 974-976, 2004 https://doi.org/10.1364/OL.29.000974
4. Y. Kanamori, M. Shimono, and K. Hane, 'Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrate,' IEEE Photon. Technol. Lett., vol. 18, no. 20, pp. 2126-2128, 2006 https://doi.org/10.1109/LPT.2006.883208
5. Z. Yu, W. Wu, L. Chen, and S.Y. Chou, 'Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications,' J. Vac. Sci. Technol. B, vol. 19, pp. 2816-2819, 2001 https://doi.org/10.1116/1.1409384
6. C. J. M. van Rijn, W. Nijdam, S. Kuiper, G. J. Veldhuis, H. van Wolferen, and M. Elwenspoek, 'Microsieves made with laser interference lithography for micro-filtration applications,' J. Micromech. Microeng., vol. 9, pp. 170-172, 1999 https://doi.org/10.1088/0960-1317/9/2/316
7. K. Seshan, Handbook of Thin Film Deposition Processes and Technologies II (Noyes Publications, New York, USA, 2002), pp. 11-43
8. S. Tibuleac and R. Magnusson, 'Reflection and transmission guided-mode resonance filters,' J. Opt. Soc. Am. A, vol. 14, no. 7, pp. 1617-1626, 1997 https://doi.org/10.1364/JOSAA.14.001617
9. Y. Ding and R. Magnusson, 'Doubly resonant single-layer bandpass optical filters,' Opt. Lett., vol. 29, no. 10, pp.1135-1137, 2004 https://doi.org/10.1364/OL.29.001135
10. E. D. Palik, Handbook of Optical Constants of Solids III (Academic Press, San Diego, USA, 1998), pp. 519-536
11. S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, 'Fabrication of a 50 nm halfpitch wire grid polarizer using nanoimprint lithography,' Nanotechnol., vol. 16, pp. 1874-1877, 2005 https://doi.org/10.1088/0957-4484/16/9/076
12. S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, S. H. Lee, J. D. Park, and P. W. Yoon, 'Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching,' Microelecton. Eng., vol. 78-79, pp. 314-318, 2005 https://doi.org/10.1016/j.mee.2004.12.040