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Fabrication and Reliability Properties of Ni-Cr Alloy Thin Film Resistors

Ni-Cr계 합금을 이용한 박막저항의 제작 및 신뢰성

  • 이봉주 (남서울대학교 전자공학과)
  • Published : 2008.01.01

Abstract

From the progressing results, it was found that thin film using 52 wt% Ni - 38 wt% Cr - 3 wt% Al - 4 wt% Mn - 3 wt% Si target has good characteristics for low TCR (temperature coefficients of resistance) and high resistivity. The optimum sputtering condition was DC 250 W, 5 mtorr, and 50 sccm and the proper annealing condition was $350^{\circ}C$/3.5 hr in air atmosphere. At these fabricated conditions, thin film resistors with TCR values of less than ${\pm}10ppm/^{\circ}C$ were obtained. The TCR of the packaged-samples made at proper fabrication conditions was $-3{\sim}15ppm/^{\circ}C$ after the thermal cycling and $-20{\sim}180ppm/^{\circ}C$ after PCT (pressure cooker test), we could confirm reliability for the thin film resistor and find the need for enduring research about packaging method.

Keywords

Thin film resistor;TCR (Temperature coefficient of resistance);Reliability

References

  1. S. Baunack, W. Brückner, W. Pitschke, and J. Thomas, 'Auger electron spectroscopy study of interdiffusion, oxidation and segregation during thermal treatment of NiCr/CuNi(Mn)/NiCr thin films', Applied Surface Science, Vol. 144-145, p. 216 1999 https://doi.org/10.1016/S0169-4332(98)00800-9
  2. D. W. braudaway, 'Precisiono resistors: a review of material characteristics, resistor design, and construction practices', IEEE Trans. Instrum, Meas., Vol. 48, No. 5, p.878, 1999 https://doi.org/10.1109/19.799639
  3. M. Naka, T. Shibayanagi, M. Maeda, M. Mori, and H. Mori, 'Thermal stability of nanostructured cr-Ni alloys', Vacuum, Vol. 73, p. 619, 2004 https://doi.org/10.1016/j.vacuum.2003.12.080
  4. 이붕주, '낮은저항온도계수를 갖는 박막저항 체 제작 및 신뢰성특성 평가', 전기전자재료학회논문지, 20권, 4호, p. 352, 2007 https://doi.org/10.4313/JKEM.2007.20.4.352
  5. J. A. Thornton, 'The microstructure of sputter-deposited coatings', J. Vac. Sci. Technol., Vol. a4, No. 6, p. 3095, 1986
  6. B.-J. Lee, 'Quaternary alloy films for thin film resistors', Jpn. Appl. Phys., Vol. 42 Pt. 1, No. 3, p. 1405, 2003 https://doi.org/10.1143/JJAP.42.1405
  7. M. Ohring, 'The materials science of thin films', Academic Press, p. 463, 1992
  8. M. A. Bayne, 'Al-doped Ni-Cr for temperature coefficient of resistance control in hybrid thin film resistors', J. Vac. Sci. Tech. A, Vol. 4, No. 6, p. 3142, 1986 https://doi.org/10.1116/1.573643
  9. K. Matsuda, 'Super precision metal film resistors', National Tech. Rep., Vol. 26, No. 2, p. 283, 1980
  10. I. H. Kazi, P. M. Wild, T. N. Moore, and M. Sayer, 'The electromechanical behavior of nichrome (80/20 wt%) film', Thin Solid Films, Vol. 433, p. 337, 2003 https://doi.org/10.1016/S0040-6090(03)00390-0