Deposition of Amorphous Carbon Layer by PECVD

PECVD에 의한 비정질 탄소층 증착

  • Jung, Ilhyun (Department of Chemical Engineering, University of Dankook)
  • 정일현 (단국대학교 화학공학과)
  • Received : 2008.03.25
  • Accepted : 2008.05.01
  • Published : 2008.06.10

Abstract

3,3-Dimethyl-1-butene ($C_6H_{12}$) monomer was deposited using a plasma-enhanced chemical vapor deposition (PECVD) instrument. The more the R.F. power/pressure ratio in FT-IR spectrum, the less the hydrogen quantity and the dangling bond in amorphous carbon films observed so that the mechanical property of the films are improved related to the density. Also, with the increase D peak in Raman spectrum is increased and the ring structure's films are produced. According to these results, hardness and modulus are 12 GPa and 85 GPa, respectively. The refractive index (n) and extinction coefficients (k) of the deposited films are increased with the increase in a power/pressure ratio.

Acknowledgement

Supported by : 단국대학교

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