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Investigation into Deformation of Three-Dimensional Microstructures via Surface Tension of a Rinsing Material During a Developing Process

현상공정에서 표면장력에 의한 극미세 3 차원 구조물의 변형거동 분석 및 저감방안에 관한 연구

  • 박상후 (부산대학교 정밀금형 및 금형가공연구소 (ERC) / 부산대학교 기계공학부) ;
  • 양동열 (한국과학기술원 기계공학과)
  • Published : 2008.04.01

Abstract

Dense and fine polymer patterns often collapse, as they come into contact with each other at their protruding tips. Resist pattern collapse depends on the aspect ratio of patterns and the surface tension of rinsing materials. The pattern collapse is a very serious problem in microfabrication, because it is one of the factors which limit the device dimensions. The reasons for the pattern collapse are known as the surface tension of rinse liquid, centrifugal force and rinse liquid flow produced in the developing process. In this work, we tried to evaluate the pattern collapse of three-dimensional microstructures that were fabricated by two-photon induced photopolymerization, and showed the way how to reduce the deformation of microstructures.

Keywords

Two-Photon Polymerization;3D Pattern Collapse;Three-Dimensional Microstructure;Surface Tension

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