A Development on the Non-Photomask Plate Making Technology for Screen Printing (II)

포토마스크가 필요 없는 스크린 제판 기술 개발(II)

  • Park, Kyoung-Jin (Department of Graphic Arts Engineering, Graduate School, Pukyoung National University) ;
  • Kang, Hyo-Jin (Department of Graphic Arts Engineering, Graduate School, Pukyoung National University) ;
  • Kim, Sung-Bin (Division of Image & Information, College of Engineering, Pukyong National University) ;
  • Nam, Su-Yong (Division of Image & Information, College of Engineering, Pukyong National University) ;
  • Ahn, Byung-Hyun (Department of Metallurgical Engineering, Pukyong National University)
  • 박경진 (부경대학교 대학원 인쇄공학과) ;
  • 강효진 (부경대학교 대학원 인쇄공학과) ;
  • 김성빈 (부경대학교 공과대학 화상정보공학부) ;
  • 남수용 (부경대학교 공과대학 화상정보공학부) ;
  • 안병현 (부경대학교 공과대학 신소재 공학부)
  • Published : 2008.12.01

Abstract

We have manufactured a photoresist which has excellent dispersity and good applying property due to 330 cps of viscosity for environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed with mask by UV-LED light source so we could manufacture the photoresist which proper for the UV light source. And it was developed by air spray with $1.7\;kgf/cm^2$ of injection pressure. Because of the excellence of power and resolution of the UV-LED light sourse, the pencil hardness and solvent resistance of curing photoresist film were excellent as those of conventional photoresist film. Moreover the $100{\mu}m$-width stripe image which has sharp edges was formed. So we confirmed a possibility of dry development process by air spray method.