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Soft-Lithographic Fabrication of Ni Nanodots Using Self-Assembled Surface Micelles

  • Seo, Young-Soo (Nano Advanced Materials Engineering, Sejong University) ;
  • Lee, Jung-Soo (Korea Atomic Energy Research Institute) ;
  • Lee, Kyung-Il (Center for Spintronics Research, Korea Institute of Science & Technology) ;
  • Kim, Tae-Wan (Nano Advanced Materials Engineering, Sejong University)
  • Published : 2008.06.30

Abstract

This study proposes a simple nano-patterning process for the fabrication of magnetic nanodot arrays on a large area substrate. Ni nanodots were fabricated on a large area (4 inches in diameter) Si substrate using the soft lithographic technique using self-assembled surface micelles of Polystyrene-block-Poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer formed at the air/water interface as a mask. The hexagonal array of micelles was successfully transferred to a Ni thin film on a Si substrate using the Langmuir-Blodgett technique. After ion-mill dry etching, a magnetic Ni nanodot array with a regular hexagon array structure was obtained. The Ni nanodot array showed in-plane easy axis magnetization and typical soft magnetic properties.

Keywords

Ni nanodot;self-assembly;nano-patterning process;diblock copolymer;surface micelle

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