Soft-Lithographic Fabrication of Ni Nanodots Using Self-Assembled Surface Micelles

  • Seo, Young-Soo (Nano Advanced Materials Engineering, Sejong University) ;
  • Lee, Jung-Soo (Korea Atomic Energy Research Institute) ;
  • Lee, Kyung-Il (Center for Spintronics Research, Korea Institute of Science & Technology) ;
  • Kim, Tae-Wan (Nano Advanced Materials Engineering, Sejong University)
  • Published : 2008.06.30


This study proposes a simple nano-patterning process for the fabrication of magnetic nanodot arrays on a large area substrate. Ni nanodots were fabricated on a large area (4 inches in diameter) Si substrate using the soft lithographic technique using self-assembled surface micelles of Polystyrene-block-Poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer formed at the air/water interface as a mask. The hexagonal array of micelles was successfully transferred to a Ni thin film on a Si substrate using the Langmuir-Blodgett technique. After ion-mill dry etching, a magnetic Ni nanodot array with a regular hexagon array structure was obtained. The Ni nanodot array showed in-plane easy axis magnetization and typical soft magnetic properties.


Ni nanodot;self-assembly;nano-patterning process;diblock copolymer;surface micelle


  1. K. Juliet et al. Langmuir 15, 7714 (1999)
  2. M. V. Meli, A. Badia, P. Grutter, and R. B. Lennox, Nano Letters 2, 131 (2002)
  3. B. D. Cullity, Introduction to Magnetic Materials, Addison-Wesley Publishing Company, New York, p. 617 (1972)
  4. B. Lin, S. A. Rice and D. A. Weitz, J. Chem. Phys., 99, 8308 (1993)
  5. J. Chang, B. A. Gribkov, H. Kim, H. Koo, S. Han, V. L. Mironov, and A. A. Fraerman, J. Magnetics, 12(1), 17 (2007)
  6. Z. Li et al. Langmuir 11, 4785 (1995)