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Characteristics of TiAlN Film on Different Buffer Layer by D.C Magnetron Sputter

D.C magnetron sputter법으로 증착된 TiAlN의 중간층에 따른 특성연구

  • Kim, Myoung-Ho (Department of Material Science & Engineering, Chonnam National University) ;
  • Lee, Doh-Jae (Department of Material Science & Engineering, Chonnam National University) ;
  • Lee, Kwang-Min (Department of Material Science & Engineering, Chonnam National University) ;
  • Kim, Woon-Sub (Department of Material Science & Engineering, Chonnam National University) ;
  • Kim, Min-Ki (Sunkyung Heavy Industrial CO.) ;
  • Park, Burm-Su (A. G. Optics Co.) ;
  • Yang, Kook-Hyun (A. G. Optics Co.)
  • 김명호 (전남대학교 공과대학 신소재공학부) ;
  • 이도재 (전남대학교 공과대학 신소재공학부) ;
  • 이광민 (전남대학교 공과대학 신소재공학부) ;
  • 김운섭 (전남대학교 공과대학 신소재공학부) ;
  • 김민기 (선경중공업(주)) ;
  • 박범수 ((주)에이지광학) ;
  • 양국현 ((주)에이지광학)
  • Published : 2008.10.27

Abstract

TiAlN films were deposited on WC-5Co substrates with different buffer layers by D.C. magnetron sputtering. The films were evaluated by microstructural observations and measuring of preferred orientation, hardness value, and adhesion force. As a process variable, various buffer layers were used such as TiAlN single layer, TiAlN/TiAl, TiAlN/TiN and TiAlN/CrN. TiAlN coating layer showed columnar structures which grew up at a right angle to the substrates. The thickness of the TiAlN coating layer was about $1.8{\mu}m$, which was formed for 200 minutes at $300^{\circ}$. XRD analysis showed that the preferred orientation of TiAlN layer with TiN buffer layer was (111) and (200), and the specimens of TiAlN/TiAl, TiAlN/CrN, TiAlN single layer have preferred orientation of (111), respectively. TiAlN single layer and TiAlN/TiAl showed good adhesion properties, showing an over 80N adhesion force, while TiAlN/TiN film showed approximately 13N and the TiAlN/CrN was the worst case, in which the layer was destroyed because of high internal residual stress. The value of micro vickers hardness of the TiAlN single layer, TiAlN/TiAl and TiAlN/TiN layers were 2711, 2548 and 2461 Hv, respectively.

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