The Transactions of The Korean Institute of Electrical Engineers (전기학회논문지)
- Volume 59 Issue 4
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- Pages.749-753
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- 2010
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- 1975-8359(pISSN)
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- 2287-4364(eISSN)
DOI QR Code
Characterizations of Surface Textured Silicon Substrated by XeF2 Etching System
이불화제논 기상 식각에 의한 실리콘 기판의 표면 텍스쳐링 특성
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김선훈
(한국광기술원 연구사업부) ;
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기현철
(한국광기술원) ;
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김두근
(한국광기술원 광융합시스템센터) ;
- 나용범 ((주)한국유화 기업부설연구소) ;
- 김남호 ((주)한국유화 기업부설연구소) ;
-
김회종
(한국광기술원)
- Received : 2010.02.26
- Accepted : 2010.03.20
- Published : 2010.06.01
Abstract
We investigated the haze and the surface roughness of textured Si substrates etched by
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Acknowledgement
Supported by : 지식경제부
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