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Fabrication of High-Quality Diffractive-Lens Mold having Submicron Patterns

서브 미크론의 패턴으로 구성된 고효율 회절 렌즈 몰드 제작

  • Woo, Do-Kyun (Dept. of Mechatronics, Gwangju Institute of Science and Technology (GIST)) ;
  • Hane, Kazuhiro (Nanomechanics, Tohoku Univ.) ;
  • Lee, Sun-Kyu (Dept. of Mechatronics, Gwangju Institute of Science and Technology (GIST))
  • Received : 2010.05.13
  • Accepted : 2010.09.13
  • Published : 2010.11.01

Abstract

In this paper, we present the fabrication of a high-quality diffractive-lens mold having submicron patterns, which is suitable for an ultra-slim optical system. In order to fabricate high-quality diffractive lens with a variety of submicron patterns, the multi-alignment method was used; high-resolution electron-beam lithography and FAB plasma etching were carried out to obtain the patterns. The most important key technology in the multi-alignment method is to reduce alignment error, lithography error, and etching error. In this paper, these major fabrication errors were minimized, and a high-quality diffractive lens with a diameter of $267\;{\mu}m$ (NA = 0.25), minimum pattern width of 226 nm, and thickness of 819 nm was successfully fabricated.

Keywords

Electron-Beam Lithography;FAB(Fast Atom Beam) Plasma Etching;Diffractive Lens;Multi-Alignment Method

Acknowledgement

Supported by : 한국과학재단

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