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Inactivation of Ralstonia Solanacearum Using Aquatic Plasma Process

수중 Plasma 공정을 이용한 Ralstonia Solanacearum 불활성화

Back, Sang-Eun;Kim, Dong-Seog;Park, Young-Seek
백상은;김동석;박영식

  • Received : 2012.01.20
  • Accepted : 2012.07.19
  • Published : 2012.07.31

Abstract

A dielectric barrier discharge (DBD) plasma reactor was investigated for the inactivation of Ralstonia Solanacearum which causes bacterial wilt in aquiculture. The DBD plasma reactor of this study was divided into power supply unit, gas supply unit and plasma reactor. The plasma reactor consisted of a quartz dielectric tube, discharge electrode (inner) and ground electrode (outer). The experimental results showed that the optimum 1st voltage, 2nd voltage, air flow rate and pH were for 100 V (1st voltage), 15 kV (2nd voltage), 4 L/min, and pH 3, respectively. At a low 1st voltage, shoulder and tailing off phenomena was observed. The shoulder phenomenon was decreased as the increase of 1st voltage. R. Solanacearum disinfection in the lower air flow rate was showed shoulder and tailing off phenomenon because the active species generated less. Under optimum condition, shoulder and tailing off phenomenon was reduced. When the 2nd voltage was less than 7.5 kV, tailing off phenomenon was observed and this was not vanishes even though the increase of the disinfection time. The inactivation efficiency increased as the increase of air flow rate, however, the efficiency decreased when the air flow rate was above 4 L/min. R. Solanacearum disinfection at pH 3 showed somewhat higher than in pH 11. The pH effect of R. Solanacearum deactivation is less than the impact on other factor.

Keywords

Dielectric barrier discharge plasma;Inactivation;Ralstonia Solanacearum;Optimum operation condition

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  2. A Study on the Inactivation of Phytophthora Blight Pathogen (Phytophthora capsici) using Plasma Process vol.23, pp.9, 2014, https://doi.org/10.5322/JESI.2014.23.9.1601
  3. Application of Inactivation Model on Phytophthora Blight Pathogen (Phytophthora capsici) using Plasma Process vol.24, pp.11, 2015, https://doi.org/10.5322/JESI.2015.24.11.1393

Acknowledgement

Supported by : 한국연구재단