Journal of Magnetics

The Korean Magnetics Society (한국자기학회)
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FeCoB Films with Large Saturation Magnetization and High Magnetic Anisotropy Field to Attain High Ferromagnetic Resonance Frequency

  • Nakagawa, Shigeki (Department of Physical Electronics, Tokyo Institute of Technology) ;
  • Hirata, Ken-Ichiro (Department of Physical Electronics, Tokyo Institute of Technology)
  • Received : 2012.05.31
  • Accepted : 2012.09.11
  • Published : 2013.06.30

Abstract

FeCoB films were being prepared on a Ru underlayer by using the oblique incidence of sputtered and back-scattered particles which have a high in-plane magnetic anisotropy field $H_k$ above 400 Oe. It is suitable to attain such deposition condition when facing targets sputtering system. The in-plane X-ray diffraction analysis clarified that there is anisotropic residual stress which is the origin of the high in-plane magnetic anisotropy. The directional crystalline alignment and inclination of crystallite growth were also observed. Such anisotropic crystalline structures may affect the anisotropic residual stress in the films. The B content of 5.6 at.% was appropriate to induce such anisotropic residual stress and $H_k$ of 410 Oe in this experiment. The film with B content of 6 at.% possessed large saturation magnetization of 22 kG and high $H_k$ of 500 Oe. The film exhibited high ferromagnetic resonance frequency of 9.2 GHz.

Keywords

FeCoB;high magnetic anisotropy field;anisotropic residual stress;ferromagnetic resonance frequency

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References

  1. A. Hashimoto, K. Hirata, T. Matsuu, S. Saito, and S. Nakagawa, IEEE Trans. Magn. 44, 3899 (2008). https://doi.org/10.1109/TMAG.2008.2002252
  2. K. Hirata, S. Gomi, and S. Nakagawa, J. Nanosci. Nanotechnol. 11, 2739 (2011). https://doi.org/10.1166/jnn.2011.2711
  3. K. Hirata, S. Gomi, Y. Mashiko, and S. Nakagawa, J. Appl. Phy. 107, 09A323 (2009).

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