Study on the FPCS for Photoresist Coating of Semiconductor Manufacturing Process

반도체 생산공정의 감광액 도포를 위한 FPCS에 관한 연구

  • 박형근 (남서울대학교 전자공학과)
  • Received : 2013.07.22
  • Accepted : 2013.09.06
  • Published : 2013.09.30


In this research, developed full-scan photoresist coating system(FPCS) can improve the efficiency of the photoresist coating system essential for spinner equipment in nano semiconductor manufacturing process. The devices developed in this research, which can be swiftly replaced in case abnormal state element changes or wafer manufacturing defect occurs, are anticipated to improve module yield as well as real-time monitoring on the state element in order to prevent the complex process defect due to the photoresist miss coating.


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