Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array

  • Joo, Junghoon (Department of Materials Science & Engineering & Plasma Materials Research Center, Kunsan National University)
  • Received : 2014.06.02
  • Accepted : 2014.07.30
  • Published : 2014.07.30


A real-time monitoring of immersed antenna type inductively coupled plasma (ICP) was done with a homemade 2 dimensional voltage probe array to check the uniformity of the plasma. Measured voltage values with a high impedance voltmeter are close to the floating potential of the plasma. As the substrate carrier was moving into a magnetron sputtering plasma diffusive from a $125mm{\times}625mm$ size cathode, measured results showed reliably separation of plasma into the upper and lower empty space over the carrier. Infra red thermal imaging camera was used to observe the cross corner effect in situ without eroding a target to the end of the usage. 3 dimensional particle trace model was used to analyze the magnetron discharge's behavior.


Supported by : National Fusion Research Institute's DRC (Degree and Research Center)


  1. S. M. Rossnagel and J. Hopwood, Appl. Phys. Lett, 63, 3285 (1993)
  2. M. Dickson, G. Zhong, and J. Hopwood, J. Vac. Sci. Technol. B 16, 523 (1998)
  3. E. Kusano, N. Kashiwagi, T. Kobayashi, H. Nanto, A. Kinbara, Proceedings of ICMCTF98, SanDiego, Apr.1998, p150
  4. M. Yamashita, J. Vac. Sci. Technol. A7 (1989) 2752
  5. Soon-Ho Kwon, Dong-Su Jang, Hee-Yong Lee and Jung-Joong Lee, J of the Kor. Phys. Soc. 59, 3042 (2011)
  6. W. Hong, S. Ko, D. Jang and J. Lee, J. Kor. Inst. Surf. Eng., 46, 192 (2012)
  7. J. Choi and J. Joo, J. Kor. Inst. Surf. Eng., 45, 75 (2012)
  8. S. Jun, J. Kim, S. Kim, Y. You and B. Cha, J. Kor. Inst. Surf. Eng., 46, 187 (2013)
  9. Y. You and J. Joo, J. Kor. Inst. Surf. Eng., 46, 168 (2013)
  10. S. Chun, J. Kor. Inst. Surf. Eng., 46, 55 (2013)
  11. D. Seo, S. Chun, J. Kor. Inst. Surf. Eng., 45, 121 (2012)
  12. Q. Fan, L. Zhou and J. Gracio, J. Phys. D: Appl. Phys. 36, 244 (2003)
  13. P. Kelly, P. Barker, G. West, J. Bradley and A. Mishra, HiPIMS workshop, 2009, presentation materials, p14
  14. T. Sheridan, M. Goeckner and J. Goree, J. Vac. Sci. Technol. A 8, 30 (1990)
  15. J. Joo, J. Kor. Inst. Surf. Eng. 41, 205 (2008)
  16. H. Chang, Fall conference of Kor. Inst. Surf. Eng. Pusan Sangnam Int. Bldg., 2009. Nov.
  17. J. Bohlmark, J. Alami, C. Christou, A. Ehiasarian and U. Helmersson, J. Vac. Sci. Technol.A 23, 18 (2005)

Cited by

  1. Non-Invasive Plasma Monitoring Tools and Multivariate Analysis Techniques for Sensitivity Improvement vol.23, pp.6, 2014,