DOI QR코드

DOI QR Code

Dynamic Magneto-mechanical Behavior of Magnetization-graded Ferromagnetic Materials

  • Chen, Lei (Key Lab of Computer Vision and Intelligent Information System, Chongqing University of Arts and Sciences) ;
  • Wang, Yao (Electrical and Computer Engineering Department, University of Minnesota)
  • Received : 2014.04.07
  • Accepted : 2014.06.18
  • Published : 2014.09.30

Abstract

This study investigates the dynamic magneto-mechanical behavior of magnetization-graded ferromagnetic materials Terfenol-D/FeCuNbSiB (MF). We measure the dynamic magneto-mechanical properties as a function of the DC bias magnetic field ($H_{dc}$). Our experimental results show that these dynamic magneto-mechanical properties are strongly dependent on the DC bias magnetic field. Furthermore, the dynamic strain coefficient, electromechanical resonance frequency, Young's moduli, and mechanical quality factor of Terfenol-D/FeCuNbSiB are greater than those of Terfenol-D under a lower DC bias magnetic field. The dynamic strain coefficient increases by a factor of between one and three, under the same DC bias magnetic field. In particular, the dynamic strain coefficient of Terfenol-D/FeCuNbSiB at zero bias achieves 48.6 nm/A, which is about 3.05 times larger than that of Terfenol-D. These good performances indicate that magnetization-graded ferromagnetic materials show promise for application in magnetic sensors.

References

  1. L. X. Bian, Y. M. Wen, P. Li, Q. L. Gao, and X. X. Liu, J. Magn. 14, 66 (2009). https://doi.org/10.4283/JMAG.2009.14.2.066
  2. G. Engdahl, Magnetostrictive Materials Handbook, San Diego: Academic Press (2000).
  3. W. Huang, B. Wang, Y. Sun, L. Weng, and W. Zhao, Proc. SPIE 6423, 64234I (2007).
  4. S. W. Or, N. Nersessian, and G. P. Carman, Proc. SPIE 4699, 451 (2002).
  5. L. Chen, P. Li, and Y. M. Wen, J. Magn. 16, 3 (2011).
  6. S. W. Or, N. Nersessian, and G. P. Carman, J. Magn. Magn. Mater. 262, 181 (2003). https://doi.org/10.1016/S0304-8853(03)00136-7
  7. S. Dong, J. Zhai, J. F. Li, and D. Viehland, J. Appl. Phys. 100, 124108 (2006). https://doi.org/10.1063/1.2402968
  8. C. Sudakar, R. Naik, G. Lawes, J. V. Mantese, A. L. Micheli, G. Srinivasan, and S. P. Alpay, Appl. Phys. Lett. 90, 062502 (2007). https://doi.org/10.1063/1.2437721
  9. S. Hong, J. G. Kim, and C. G. Kim, J. Magn. 14, 71 (2009). https://doi.org/10.4283/JMAG.2009.14.2.071
  10. F. Claeyssen, N. Lhermet, R. Le Letty, and P. Bouchilloux, J. Alloys Compd. 258, 61 (1997). https://doi.org/10.1016/S0925-8388(97)00070-4
  11. S. X. Dong, J. Y. Zhai, J. F. Li, and D. Viehland, Appl. Phys. Lett. 88, 082907 (2006). https://doi.org/10.1063/1.2178582