A Comparative Study of Nanocrystalline TiAlN Coatings Fabricated by Direct Current and Inductively Coupled Plasma Assisted Magnetron Sputtering

DC 스퍼터법과 유도결합 플라즈마를 이용한 마그네트론 스퍼터링으로 제작된 나노결정질 TiAlN 코팅막의 물성 비교 연구

  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University) ;
  • Kim, Se-Chul (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 전성용 (목포대학교 신소재공학과) ;
  • 김세철 (목포대학교 신소재공학과)
  • Received : 2014.07.29
  • Accepted : 2014.08.21
  • Published : 2014.09.30


Nanocrystalline TiAlN coatings were prepared by reactively sputtering TiAl metal target with $N_2$ gas. This was done using a magnetron sputtering system operated in DC and ICP (inductively coupled plasma) conditions at various power levels. The effect of ICP power (from 0 to 300 W) on the coating microstructure, corrosion and mechanical properties were systematically investigated using FE-SEM, AFM and nanoindentation. The results show that ICP power has a significant influence on coating microstructure and mechanical properties of TiAlN coatings. With increasing ICP power, the coating microstructure evolved from the columnar structure typical of DC sputtering processes to a highly dense one. Average grain size of TiAlN coatings decreased from 15.6 to 5.9 nm with increasing ICP power. The maximum nano-hardness (67.9 GPa) was obtained for the coatings deposited at 300 W of ICP power. The smoothest surface morphology (Ra roughness 5.1 nm) was obtained for the TiAlN coating sputtered at 300 W ICP power.


Supported by : 교육부


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