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Fabrication of Transparent Conducting Thin Film with High Hardness by Wet Process

습식 공정법에 의한 고경도 투명 전도막 제조

  • Received : 2015.11.18
  • Accepted : 2015.11.24
  • Published : 2015.12.01

Abstract

Transparent Ag nanowire conducting thin films with high surface hardness were fabricated by bar coating method. When coating speed was changed from 35 mm/sec to 50 mm/sec, the transmittance of coated glass increased from 65.3% to 80.8% in visible light range and the surface resistance was changed from $10.1{\Omega}/sq$ to $23.3{\Omega}/sq$. The surface hardness and adhesion of thin film were 5H and 5B.

Keywords

Wet process;Conducting film;Ag nanowire;Sol-gel hybrid binder;Hardness

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Acknowledgement

Supported by : 한국세라믹기술원