DOI QR코드

DOI QR Code

Fabrication of Ultra-smooth 10 nm Silver Films without Wetting Layer

Devaraj, Vasanthan;Lee, Jongmin;Baek, Jongseo;Lee, Donghan

  • 투고 : 2016.01.25
  • 심사 : 2016.02.15
  • 발행 : 2016.03.30

초록

Using conventional deposition techniques, we demonstrate a method to fabricate ultra-smooth 10 nm silver films without using a wetting layer or co-depositing another material. The argon working pressure plays a crucial role in achieving an excellent surface flatness for silver films deposited by DC magnetron sputtering on an InP substrate. The formation of ultra-smooth silver thin films is very sensitive to the argon pressure. At the optimum deposition condition, a uniform silver film with an rms surface roughness of 0.81 nm has been achieved.

키워드

Silver;Ultra-thin;Surface roughness;Sputtering;Atomic force microscopy;Nanophotonics

참고문헌

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과제정보

연구 과제 주관 기관 : Chungnam National University