증착율 변화에 따른 TIO 박막의 전기적, 광학적 특성 변화

Moon, Hyun-Joo;Kim, Daeil

  • 투고 : 2016.02.05
  • 심사 : 2016.02.23
  • 발행 : 2016.03.30


TIO thin films were deposited on the poly-carbonate substrates with RF magnetron sputtering under different sputtering power condition to investigate the influence of deposition rate on the electrical and optical properties of the films. Although, all films have the similar carrier concentration, the films prepared at a lower deposition rate of 4 nm/min show a higher mobility of $5.96cm^2\;V^{-1}S^{-1}$ due to the low surface roughness. In addition, optical transmittance is also influenced by a deposition rate. Based on the figure of merit, it can be concluded that the lower deposition rate effectively enhances the opto-electrical performance of IGZO films for use as transparent conducting oxides in flexible display applications.


IGZO;magnetron sputtering;deposition rate;figure of merit


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피인용 문헌

  1. Influence of Post-depsotion Vacuum Annealing on the Properties of SnO2Thin Films vol.29, pp.4, 2016,
  2. Effect of Electron Irradiation on the Electrical and Optical Properties of SnO2Thin Films vol.29, pp.3, 2016,
  3. Influence of Ni Interlayer on the Electrical and Optical Properties of SnO2thin films vol.29, pp.5, 2016,


연구 과제 주관 기관 : 교육부, 한국연구재단