Analysis of Sputter-Deposited SnO thin Film with SnO/Sn Composite Target

SnO/Sn 혼합 타겟을 이용한 SnO 박막 제조 및 특성

  • Received : 2016.01.28
  • Accepted : 2016.03.18
  • Published : 2016.04.27


Tin oxides have been studied for various applications such as gas detecting materials, transparent electrodes, transparent devices, and solar cells. p-type SnO is a promising transparent oxide semiconductor because of its high optical transparency and excellent electrical properties. In this study, we fabricated p-type SnO thin film using rf magnetron sputtering with an SnO/Sn composite target; we examined the effects of various oxygen flow rates on the SnO thin films. We fundamentally investigated the structural, optical, and electrical properties of the p-type SnO thin films utilizing X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV/Vis spectrometry, and Hall Effect measurement. A p-type SnO thin film of $P_{O2}=3%$ was obtained with > 80% transmittance, carrier concentration of $1.12{\times}10^{18}cm^{-3}$, and mobility of $1.18cm^2V^{-1}s^{-1}$. With increasing of the oxygen partial pressure, electrical conductivity transition from p-type to n-type was observed in the SnO crystal structure.


SnO;tin oxide;reactive sputtering;composite target;p-type thin film


  1. H. Hosono, N. Kikuchi, N. Ueda and H. Kawazoe, J. Non-Cryst. Solids, 198-200, 165 (1996).
  2. E. Leja, J. Korecki, K. Krop and K. Toll, Thin Solid Films, 59, 147 (1979).
  3. M. Batzill and U. Diebold, Prog. Surf. Sci., 79, 47 (2005).
  4. B. G. Lewis and D.C. Paine, MRS Bull., 25, 22 (2000).
  5. V. Demarne and A. Grisel, Sens. Actuators, A, 13, 301 (1988).
  6. Y. Ogo, H. Hiramatsu, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano and H. Hosono, Appl. Phys. Lett., 93, 032113:1 (2008).
  7. P. C. Hsu, C. J. Hsu, C. H. Chang, S. P. Tsai, W. C. Chen, H. H. Hsieh and C. C. Wu, ACS Appl. Mater. Interfaces, 6, 13724 (2014).
  8. H. Hosono, J. Non-Cryst. Solids, 352, 851 (2006).
  9. Z. Ji, Z. He, Y. Song, K. Liu and Z. Ye, J. Cryst. Growth, 259, 282 (2005).
  10. J. Ni, X. Zhao, X. Zheng, J. Zhao and B. Liu, Acta Mater., 58, 278 (2009).
  11. J. Zhao, X. J. Zhao, J. M. Ni, H. Z. Tao, Acta Mater., 58, 6243 (2010).
  12. X. Q. Pan and L. Fu, J. Appl. Phys., 58, 6048 (2001).
  13. L. Y. Liang, Z. M. Liu, H. T. Cao, Y. Y. Shi, X. L. Sun, Z. Yu, A. H. Chen, H. Z. Zhang and Y. Q. Fang, ACS Appl. Mater. Interfaces, 2, 1565 (2010).
  14. Y. R. Kim and S. E. Kim, J. Kor. Ceram. Soc., 49, 448 (2012).
  15. Y. R. Kim, S. P. Kim, S. D. Kim and S. E. Kim, Kor. J. Mater. Res., 20, 42 (2010).
  16. H. D. Kim, J. S. Choi and D. W. Shin, J. Kor. Ceram. Soc., 39, 386 (2002).
  17. S. P. Kim, S. D. Kim and S. E. Kim, J. Kor. Ceram. Soc., 48, 316 (2011).
  18. H. Hosono, Y. Ogo, H. Yanagi and T. Kamiya, Electrochem. Solid-State Lett., 14, H13 (2011).
  19. J. Szuber, G. Czempik, R. Larciprete, D. Koziej and B. Adamowicz, Thin Solid Films, 391, 198 (2001).
  20. Y. H. Jiang, I. C. Chiu, P. K. Kao, J. C. He, Y. H. Wu, Y. J. Yang, C. C. Hsu, I. C. Cheng and J. Z. Chen, Appl. Surf. Sci., 327, 358 (2015).
  21. T. Yang, J. Zhao, X. Li, X. Gao, C. Xue, Y. Wu and R. Tai, Mater. Lett., 139, 39 (2015).
  22. M. Liao, Z. Xiao, F. Y. Ran, H. Kumomi, T. Kamiya and H. Hosono, ECS J. Solid State Sci. Technol., 4, Q26 (2014).
  23. H. Yabuta, N. Kaji, R. Hayashi, H. Kumomi, K. Nomura, T. Kamiya, M. Hirano and H. Hosono, Appl. Phys. Lett., 97, 072111 (2010).
  24. W. Guo, L. Fu, Y. Zhang, K. Zhang, L. Y. Liang, Z. M. Liu, H. T. Cao and X. Q. Pan, Appl. Phys. Lett., 96, 042113:1 (2010).
  25. O. Stenzel, The physics of Thin Film Optical Sepctra: An Introduction, p.214, Springer (2005).


Supported by : National Research Foundation of Korea (NRF)