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Study on the Trap Parameters according to the Nitridation Conditions of the Oxide Films

산화막의 질화 조건에 따른 트랩 파라미터에 관한 연구

  • Received : 2016.04.06
  • Accepted : 2016.05.24
  • Published : 2016.05.31

Abstract

In this paper, the MIS(: Metal-Insulator-Semiconductor) Capacitor with the nitrided-oxide by RTP are fabricated to investigate the carrier trap parameters due to avalanche electron injection. Two times turn-around phenomenon of the flatband voltage shift generated by the avalanche injection are observed. This shows that electron trapping occurs in the oxide film at the first stage. As the electron injection increases, the first turn-around occures due to a positive charge in the oxide layer. After further injection, the curves turns around once again by electron captured. Based on the experimental results, the carrier trapping model for system having multi-traps is proposed and is fitting with experimental data in order to determine trap parameter of nitrided-oxide.

Keywords

Oxide Films;Nitridation;Trap;Injection

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