파워 게이팅 설계에서 IR Drop에 견고한 셀 배치 방법

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권석일;한태희
Kwon, Seok Il;Han, Tae Hee

  • 투고 : 2016.02.02
  • 심사 : 2016.05.31
  • 발행 : 2016.06.25

초록

파워 게이팅은 반도체 칩의 누설전류(leakage current)를 감소시키는 데 효과적인 기술로 알려져 있으며, 전원 차단용 파워게이팅 셀 (power-gating cell, PGC)에서의 IR drop 증가로 인한 성능 및 신뢰성 저하에 대해 많은 연구가 이루어져왔다. 그러나 최신 공정에서는 트랜지스터 사이즈 감소 추세에도 불구하고 금속 배선의 스케일링이 제한됨에 따라, IR drop에 견고한 파워 게이팅 설계 시 셀 배치와 금속 배선 면적을 고려한 새로운 접근 방식이 필요하다. 본 논문에서는 셀 점유율(cell utilization)과 소모 전류에 근거한 로직 셀 배치 기법을 통해 PGC 면적 및 IR drop을 개선한 파워 게이팅 설계 방법을 제안한다. 28nm 공정으로 제조된 스마트폰용 어플리케이션 프로세서(Application processor, AP) 내 고속 디지털 코어에 적용한 결과 기존 PGC 배치 기법 대비 PGC 면적은 12.59~16.16%, 최대 IR drop은 8.49% 감소함을 확인하였다.

키워드

파워 게이팅;파워 게이팅 셀 배치;전류 기반 로직 셀 배치;배선 면적

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과제정보

연구 과제 주관 기관 : 정보통신기술진흥센터, 한국연구재단