Development of Ag Nanowire Patterning Process Using Sacrificial Layer

희생층을 이용한 은 나노와이어 패터닝 공정 개발

  • Received : 2016.05.03
  • Accepted : 2016.06.13
  • Published : 2016.07.01


We developed a Ag nanowire patterning technique using a water-soluble sacrificial layer. To form a water-soluble sacrificial layer, germanium was deposited on the substrate and then water-soluble germanium oxide was simply formed by thermal oxidation of germanium using a conventional furnace. The formation of Ag nanowire patterns with various line and space arrangements was successfully demonstrated using this patterning process. The main advantage of this patterning technique is that it does not use a strong acid etchant, thereby preventing damage to the Ag nanowire during the patterning process.


Ag nanowire;Sacrificial layer;Germanium oxide;SU-8


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Supported by : 한국산업기술진흥협회, 한국연구재단