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ALD Pt 나노입자의 고온 거동에 대한 연구

안지환
An, Jihwan

  • 투고 : 2016.05.10
  • 심사 : 2016.06.28
  • 발행 : 2016.08.01

초록

This paper covers the investigation of the microscale behavior of Pt nanostrucures fabricated by atomic layer deposition (ALD) at elevated temperature. Nanoparticles are fabricated at up to 70 ALD cycles, while congruent porous nanostructures are observed at > 90 ALD cycles. The areal density of the ALD Pt nanostructure on top of the SiO2 substrate was as high as 98% even after annealing at $450^{\circ}C$ for 1hr. The sheet resistance of the ALD Pt nanostructure dramatically increased when the areal density of the nanostructure decreased below 85 - 89% due to coarsening at elevated temperature.

키워드

원자층증착법;백금 촉매;열적안정성;나노구조

참고문헌

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과제정보

연구 과제 주관 기관 : 서울과학기술대학교