• Title, Summary, Keyword: $SiO_2-P_2O_5-B_2O_3$ Glass Soot

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Characterization of $SiO_2-P_2O_5-B_2O_3$ Glass Soot fabricated by Flame Hydrolysis Deposition (화염 가수분해 증착에 의해 형성된 $SiO_2-P_2O_5-B_2O_3$ 유리 미립자의 특성)

  • 최춘기;정명영;최태구
    • Journal of the Korean Ceramic Society
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    • v.34 no.8
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    • pp.811-816
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    • 1997
  • SiO2-P2O5-B2O3 glass soot was fabricated by flame hydrolysis deposition and their properties by SEM, XRD, TGA-DSC were investigated., The mechanism of consolidation process of a glass soot as a function of consolidation temperature was analyzed by SEM observations. In the XRD patterns, the crystalline peaks which seem to be generated from B2O3 and BPO4 were observed. When the temperature of heat treatment exceeded 105$0^{\circ}C$, the non-crystalline state of SiO2-P2O5-B2O3 glass was observed. In the TGA-DSC curves, the evaporation of water molecule by a sudden endothermic reaction was observed at 128$^{\circ}C$ and a broad endothermic peak was seen in the temperature range of 40$0^{\circ}C$-95$0^{\circ}C$, without any weight loss. Finally, this peak was began to recover its baseline at 953$^{\circ}C$. This point is equal to the temperature at which the densification begins. Furthermore, we observed that the addition of dopants such as P2O5 and B2O3 decrease the onset of consolidation temperature till 95$0^{\circ}C$.

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Effect of partial sintering of silicate soots on refractive index of the silcate glass films deposited by FHD Process (FHD 공정으로 Si wafer에 증착된 silicate soot의 부분 소결 처리가 굴절률 변화에 미치는 영향)

  • 유성우;정우영;백운출;한원택
    • Proceedings of the Optical Society of Korea Conference
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    • pp.46-47
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    • 2002
  • Flame Hydrolysis Deposition (FHD) 공정은 SiC1$_4$, GeCl$_4$, POC1$_3$, BCl$_3$ 등의 원료를 사용하여 Si wafer 및 유리기판 위에 silicate soot를 증착하는 방법이며, 증착된 soot는 고온에서 소결과정을 거쳐 B$_2$O$_3$-P$_2$O$_{5}$ -GeO$_2$-SiO$_2$(BPGS)계 유리막으로 형성된다. 유리막의 굴절률은 SiC1$_4$, GeCl$_4$, POC1$_3$, BCl$_3$ 등의 원료 유량을 조절하여 변화가능하며 이를 이용하여 광도파로를 제작할 수 있다 특히 광통신에 사용할 수 있는 광증폭기 등의 능동형 광소자 제작을 위해서는 FHD공정을 통해 형성된 soot에 Er$^{3+}$ 등의 희토류 원소를 첨가하여야 한다. (중략)

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The Effective $P_2O_5$ Doping into $B_2O_3-P_2O_5-SiO_2$ Silica Layer Fabrication by Flame Hydrolysis Deposition (FHD법에 의한 $B_2O_3-P_2O_5-SiO_2$ 실리카막의 효과적인 $P_2O_5$ 도핑)

  • 심재기;이윤학;성희경;최태구
    • Journal of the Korean Ceramic Society
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    • v.35 no.4
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    • pp.364-370
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    • 1998
  • Boron-phoshor-silicate glass was fabricated on Si substrates by FHD(Flame Hydrolysis Deposition) The microstructrue of silica soot deposited at various conditon such as composition and substrate temperature was analysed by SEM. After consolidation the refractive index and composition of the silica layer were in-vestigated. For refractive index control B, P and Ge were used as additive elements while B and Ge oxides are easily mixed into $SiO_2$, P oxide($B_2O_3$) doping is difficult because of the volatile property due to low melt-ing point. Boron-phosphorous-silicate glass (BPSG) layer were fabricated using bertical torch and optimized flame temperature substrate temperature and distance of torch and substrate. P concentration of BPSG lay-er measured 3.3 Wt% and the consolidation temperature was lower than $1180^{\circ}C$. The measured refractive index of BPSG silica layer in $1.55\;\mu\textrm{m}$ wavelength was $1.4480{\pm}1{\times}10^{-1}$ and the thickness was $22{\pm}1\;\mu\textrm{m}$.

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