• Title, Summary, Keyword: 고분자형 산 증식제

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A Novel Photoresist based on Polymeric Acid Amplifier (고분자형 산 증식제에 기초한 새로운 포토레지스트의 연구)

  • Lee, Eun-Ju;Jeong, Yong-Seok;Lim, Kwon-Taek;Jeong, Yeon-Tae
    • Journal of the Korean Chemical Society
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    • v.48 no.1
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    • pp.39-45
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    • 2004
  • Acid amplifying copolymers are synthesized by the copolymerization of tert-butyl methacrylate(tBMA) with acid-sensitive functional group and 4-hydroxy-4'p-styrenesufonyloxyisopropylidene dicyclohexane(HSI) or 4-p-styrenesulfonyloxy-4'-tosyloxyisopropylidenedicyclohexane(STI) with acid-amplifying group as novel polymeric acid amplifying photoresists. Poly(HSI-co-tBMA) film and Poly(STI-co-tBMA) film as acid amplifying photoresists show reasonable thermal stability in the absence of an acid species. Poly(STI-co-tBMA) film exhibits 2X higher photosensitivity, whereas Poly(HSI-co-tBMA) film show 2X lower photosensitivity compared with ptBMA homopolymer. The attachment of acid-amplifying units to polymer backbones could provide a novel way to enhance the photosensitivity of acid-sensitive polymers depending on the structure of acid-amplifying units.