• Title, Summary, Keyword: Ion source

Search Result 918, Processing Time 0.053 seconds

A Feasibility Study on the Cold Hollow Cathode Gas Ion Source for Multi-Aperture Focused Ion Beam System (다개구 이온빔 가공장치용 냉음극 방식의 가스 이온원의 가능성 평가에 관한 연구)

  • Choi, Sung-Chang;Kang, In-Cheol;Han, Jae-Kil;Kim, Tae-Gon;Min, Byung-Kwon
    • Journal of the Korean Society for Precision Engineering
    • /
    • v.28 no.3
    • /
    • pp.383-388
    • /
    • 2011
  • The cold hollow cathode gas ion source is under development for multi aperture focused ion beam (FIB) system. In this paper, we describe the cold hollow cathode ion source design and the general ion source performance using Ar gas. The glow discharge characteristics and the ion beam current density at various operation conditions are investigated. This ion source can generate maximum ion beam current density of approximately 120 mA/$cm^2$ at ion beam potential of 10 kV. In order to effectively transport the energetic ions generated from the ion source to the multi-aperture focused ion beam(FIB) system, the einzel lens system for ion beam focusing is designed and evaluated. The ions ejected from the ion source can be forced to move near parallel to the beam axis by adjusting the potentials of the einzel lenses.

Fabrication of Potassium Ion Source and its Emission Characteristics

  • Choi, Dae Sun
    • Applied Science and Convergence Technology
    • /
    • v.25 no.6
    • /
    • pp.116-119
    • /
    • 2016
  • In this study, we fabricated the $K^+$ ion source for the various purposes and investigated the emission characteristics. The fabricated $K^+$ ion source was painted in the tungsten filament to make filament type ion source. The RGA spectra show that the filament type $K^+$ ion source has a good out gassing character, so it can be used in the ultra-high vacuum system. The maximum $K^+$ ion current was 20 mA when filament temperature was 1410 K and filament potential was 50 V. When the filament temperature was 1070 K, the initial beam current was 50 mA and decreased only by 2% during 4 hours. The emitting energy was measured to be 2.04 eV. This low value means that the fabricated specimen is a good $K^+$ ion source. We conclude that this filament type ion source can be used in various fields, including the LEIS research.

Study on the Beam Properties of the Microwave Ion Source

  • Kwon, Hyeok-Jung
    • Journal of the Korean Physical Society
    • /
    • v.71 no.11
    • /
    • pp.814-817
    • /
    • 2017
  • A test bench of the microwave ion source has been developed at Korea Multipurpose Accelerator Complex (KOMAC). Several modifications were done to improve the performance of the ion source. Beam properties such as an emittance and a profile were measured according to the operating parameters and extraction geometries. In this paper, the characteristics of ion source at test bench are presented in a viewpoint of the beam properties and the improvement of the ion source for 100 MeV linac based on the result is reported.

Characteristics of Critical Pressure for a Beam Shape of the Anode Type ion Beam Source

  • Huh, Yunsung;Hwang, Yunseok;Kim, Jeha
    • Applied Science and Convergence Technology
    • /
    • v.27 no.4
    • /
    • pp.61-65
    • /
    • 2018
  • We studied the critical pressure characteristics of an anode type ion beam source driven by both charge repulsion and diffusion mechanism. The critical pressure $P_{crit}$ of the diffusion type ion beam source was linearly decreased from 2.5 mTorr to 0.5 mTorr when the gas injection was varied in 3~10 sccm, while the $P_{crit}$ of the charge repulsion ion beam source was remained at 3.5 mTorr. At the gas injection of 10 sccm, the range of having normal beam shape in the charge repulsion ion beam source was about 6.4 times wider than that in the diffusion type ion beam source. An impurity of Fe 2p (KE = 776.68 eV) of 12.88 at. % was observed from the glass surface treated with the abnormal beam of the charge repulsion type ion beam source. The body temperature of the diffusion type ion beam source was observed to increase rapidly at the rate of $1.9^{\circ}C/min$ for 30 minutes and to vary slowly at the rate of $0.1^{\circ}C/min$ for 200 minutes for an abnormal beam and normal beam, respectively.

Simulation Study of the Beam Trajectory Effect on the Magnetic Field Distribution of a Duoplasmatron

  • Park, Sae-Hoon;Lee, Sang-Hun;Kim, Yu-Seok
    • Journal of the Korean Physical Society
    • /
    • v.73 no.8
    • /
    • pp.1093-1098
    • /
    • 2018
  • Recently, a gas interface system was developed for accelerator mass spectrometry with a cesium sputtering ion source. A gaseous ion source was proposed and designed to eliminate the solidification and graphitization process in radiocarbon dating. A simulation study of the ion source for a gas sample analysis system was conducted to investigate the characteristics of the ion source when different anode shapes were used, and the results are reported in this paper. The use of different anode shapes revealed the influence of magnetic field penetration on the plasma within the expansion cup. An axial magnetic field constrains the discharge, producing greater ionization density. The ion beam trajectories from the ion source were calculated using the SIMION program to examine the dependence of the changes in the magnetic field distribution on the shape of the ion source's anode.

Emittance Measurements of the Ion Sources for Induction Linac Driven Heavy Ion Fusion

  • Lee, Heon-Ju
    • Nuclear Engineering and Technology
    • /
    • v.29 no.3
    • /
    • pp.181-185
    • /
    • 1997
  • The ion sources for induction linac driven heavy ion fusion were fabricated and their omittance characteristics were investigated. For to kinds of ion sources, i. e. a carbon vacuum arc ion source and a cusp field rf ion source, the emittance was measured with a double slit beam scanner. The required normalized omittance of an ion source for heavy ion fusion is 10$^{-7}$ - 5$\times$10$^{-7}$ $\pi$ m-rod, and the measured emittances of the ion beams from carbon vacuum arc ion source and cusp field rf ion source (Ne$^{+}$) were 2$\times$10$^{-6}$ $\pi$ m-rad and 4$\times$10$^{-7}$ $\pi$ m-rad, respectively.y.

  • PDF

Development of a Low Power Micro-Ion Engine Using Microwave Discharge

  • Koizumi, Hiroyuki;Kuninaka, Hitoshi
    • Proceedings of the Korean Society of Propulsion Engineers Conference
    • /
    • /
    • pp.842-848
    • /
    • 2008
  • In this study, we propose a novel micro-ion engine system. Single plasma source is used for both ion beam source and neutralizing electron source. By changing the electrical connection, either operation can be switched. This micro-ion engine system gives translation motion and attitude control to microspacecraft. The major objective of this study is verification of our concept. Small plasma source of 20 mm diameter was developed. Plasma was sustained by microwave power. Using this plasma source, ion beam extraction and electron emission was successively demonstrated.

  • PDF

Development and characteristic study of high brightness ion source using inductively coupled plasma for focused ion beam (유도결합 플라즈마를 이용한 집속이온빔용 고휘도 이온원의 개발 및 특성연구)

  • Kim, Yoon-Jae;Park, Dong-Hee;Hwang, Yong-Seok
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
    • /
    • /
    • pp.494-499
    • /
    • 2004
  • A ion source using inductively coupled plasma has been tested in order to test its feasibility as a high brightness ion source for focused ion beam. When operating the ion source with filter magentas in front of plasma electrode for a negative ion source, lower remittances are expected. Extracted beam remittances are measured with an Allison-type scanning device for various plasma parameters and extraction conditions. The normalized omittance has been measured to be around 0.2$\pi$mmmrad with beam currents of up to 0.55 ㎃. In particular, noting that multicusp magnets have a role in decreasing the remittance as well as increasing plasma discharge efficiency, transverse magnetic field has been confirmed to be a useful tool fur decreasing remittance via electron energy control.

  • PDF

Development of High Flux Metal Ion Plasma Source for the Ion Implantation and Deposition

  • Kim, Do-Yun;Lee, Eui-Wan
    • Journal of Korean Vacuum Science & Technology
    • /
    • v.7 no.2
    • /
    • pp.45-56
    • /
    • 2003
  • A high flux metal plasma pulse ion source, which can simultaneously perform ion implantation and deposition, was developed and tested to evaluate its performance using the prototype. Flux of ion source was measured to be 5 A and bi-polar pulse power supply with a peak voltage of 250 V, repetition of 20 Hz and width of 100 ${\mu}\textrm{s}$ has an output current of 2 kA and average power of 2 kW. Trigger power supply is a high voltage pulse generator producing a peak voltage of 12 kV, peak current of 50 A and repetition rate of 20 Hz. The acceleration column for providing target energy up to ion implantation is carefully designed and compatible with UHV (ultra high vacuum) application. Prototype systems including various ion sources are fabricated for the performance test in the vacuum and evaluated to be more competitive than the existing equipments through repeated deposition experiments.

  • PDF