• Title, Summary, Keyword: Magnetron sputtering

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Simulation and Characteristic Measurement with Sputtering Conditions of Triode Magnetron Sputter

  • Kim, Hyun-Hoo;Lim, Kee-Joe
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.1
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    • pp.11-14
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    • 2004
  • An rf triode magnetron sputtering system is designed and installed its construction in vacuum chamber. In order to calibrate the rf triode magnetron sputtering for thin films deposition processes, the effects of different glow discharge conditions were investigated in terms of the deposition rate measurements. The basic parameters for calibrating experiment in this sputtering system are rf power input, gas pressure, plasma current, and target-to-substrate distance. Because a knowledge of the deposition rate is necessary to control film thickness and to evaluate optimal conditions which are an important consideration in preparing better thin films, the deposition rates of copper as a testing material under the various sputtering conditions are investigated. Furthermore, a triode sputtering system designed in our team is simulated by the SIMION program. As a result, it is sure that the simulation of electron trajectories in the sputtering system is confined directly above the target surface by the force of E${\times}$B field. Finally, some teats with the above 4 different sputtering conditions demonstrate that the deposition rate of rf triode magnetron sputtering is relatively higher than that of the conventional sputtering system. This means that the higher deposition rate is probably caused by a high ion density in the triode and magnetron system. The erosion area of target surface bombarded by Ar ion is sputtered widely on the whole target except on both magnet sides. Therefore, the designed rf triode magnetron sputtering is a powerful deposition system.

IGZO films deposited by DC and DC pulsed magnetron sputtering (DC와 DC pulsed magnetron sputtering을 이용한 IGZO 박막 증착)

  • Kim, Min-Su;Kim, Se-Yun;Seong, Sang-Yun;Jo, Gwang-Min;Hong, Hyo-Gi;Lee, Jun-Hyeong;Kim, Jeong-Ju;Heo, Yeong-U
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • pp.139-139
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    • 2011
  • DC magnetron sputtering과 DC pulsed magnetron sputtering을 이용하여 공정 압력별, $O_2$ 분압별, 온도등의 증착조건에 따른 IGZO 박막의 특성을 조사하였다. Working pressure 따른 deposition rate 측정한 결과 동일 파워 적용 시 DC magnetron sputtering 대비하여 DC pulsed magnetron sputtering 은 약 84% 수준에 머물렀으며, IGZO 박막 내에 $O_2$의 분압비가 증가함에 따라 투과도는 단파장 영역에서 장파장 영역으로 갈수록 상승 경향을 보였다. 캐리어 농도와 이동도 등 전기적 특성도 증가하는 경향을 보였다. 온도에 따른 전기적 특성을 비교 해 본 결과 상온과 $150^{\circ}C$ 영역에서는 유의차가 없었으며, DC pulsed magnetron sputtering의 경우 $50^{\circ}C$ 영역에서 변곡점이 형성됨을 알수 있었다.

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Growth of p-ZnO by RF-DC magnetron co-sputtering (RF-DC magnetron co-sputtering법에 의한 p-ZnO 박막의 성장)

  • Kang Seung Min
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.14 no.6
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    • pp.277-280
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    • 2004
  • p-ZnO films have been grown on (0001) sapphire substrates by RF-DC magnetron co-sputtering. The p-ZnO single crystalline thin films of the thickness about 120 nm were grown successfully. The dopant (Aluminum) was sputtered simultaneously from Al metal target by DC sputtering during rf-magnetron sputtering of ZnO at the substrate temperatures of $400^{\circ}C$ and $600^{\circ}C$ respectively. The crystallinity and optical properties of as-grown P-ZnO films have been characterized.

Characteristic evaluations and production of triode magnetron sputtering system (Triode magnetron sputtering system의 제작 및 특성평가)

  • Kim, H.H.;Lee, M.Y.;Kim, K.T.;Yoon, S.H.;Yoo, H.K.;Kim, J.M.;Park, C.H.;Lim, K.J.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • pp.787-790
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    • 2003
  • A rf triode magnetron sputtering system is designed and installed its construction in vacuum chamber. In order to calibrate the rf triode magnetron sputtering for thin films deposition processes, the effects of different glow discharge conditions were investigated in terms of the deposition rate measurements. The basic parameters for calibrating experiment in this sputtering system are rf power input, gas pressure, plasma current, and target-to-substrate distance. Because a knowledge of the deposition rate is necessary to control film thickness and to evaluate optimal conditions which are an important consideration in preparing better thin films, the deposition rates of copper as a testing material under the various sputtering conditions are investigated. Furthermore, a triode sputtering system designed in our team is simulated by the SIMION program. As a result, it is sure that the simulation of electron trajectories in the sputtering system is confined directly above the target surface by the force of $E{\times}B$ field. Finally, some teats with the above 4 different sputtering conditions demonstrate that the deposition rate of rf triode magnetron sputtering is relatively higher than that of the conventional sputtering system. This means that the higher deposition rate is probably caused by a high ion density in the triode and magnetron system. The erosion area of target surface bombarded by Ar ion is sputtered widely on the whole target except on both magnet sides. Therefore, the designed rf triode magnetron sputtering is a powerful deposition system.

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Development of magnetron sputtering system for Al thin film decomposition with high uniformity (고균일 Al 박막 증착을 위한 magnetron sputtering system 개발)

  • Lee, J.H.;Hwang, D.W.
    • Journal of the Korean Vacuum Society
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    • v.17 no.2
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    • pp.165-169
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    • 2008
  • It is very important to decompose uniformly the metal film in semiconductor devices process. The thickness uniformity of the ITO film by standard magnetron sputtering system are about $\pm4%\sim\pm5%$ and the center of the wafer is more thick than the edge of the wafer. We designed and made the discharge electrode structure and controlled the direction of sputtering materials in magnetron sputtering system. The thickness uniformity are increased to $\pm0.8\sim1.3%$ in 4" wafer using the new sputtering gun in magnetron sputtering system. In wafer to wafer thickness uniformity, $\pm$5.3% are increased to $\pm$1.5% using the new sputtering gun. The thickness uniformity of the Al film are about $\pm$1.0% using the new sputtering gun in magnetron sputtering system.

RF-enhanced DC-magnetron Sputtering of Indium Tin Oxide

  • Futagami, Toshiro;Kamei, Masayuki;Yasui, Itaru;Shigesato, Yuzo
    • The Korean Journal of Ceramics
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    • v.7 no.1
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    • pp.26-29
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    • 2001
  • Indium tin oxide (ITO) films were deposited on glass substrates at $300^{\circ}C$ in oxygen/argon mixtures by RF-enhanced DC-magnetron sputtering and were compared to those by conventional DC magnetron sputtering. The RF enhancement was performed using a coil above an ITO target. X-ray diffraction measurements revealed that RF-enhanced plasma affected the preferred orientation and the crystallinity of the films. The resistivity of the films prepared by RF-enhanced DC-magnetron sputtering was almost constant at oxygen content lower than 0.3% and then increased sharply with increasing oxygen content. However the resistivity of the films by conventional sputtering has little dependence on the oxygen content. Those results can be explained on the basis of the incorporation of oxygen into the ITO films due to the RF enhancement.

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MPP (Modulated Pulsed Power)와 Magnetron Sputtering을 이용한 박막의 특성 평가

  • Min, Gwan-Sik;Yun, Ju-Yeong;Sin, Yong-Hyeon;Cha, Deok-Jun;Yeo, Chang-Eop;Park, Hwan-Yeol;Heo, Yun-Seong;Tae, Gi-Gwan;Kim, Jin-Tae
    • Proceedings of the Korean Vacuum Society Conference
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    • pp.256-256
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    • 2013
  • 기존에 사용되어 오던 DCMS (DC magnetron sputtering)과 HPPMS (high-power pulsed magnetron sputtering)에 비해 MPP를 이용한 magnetron sputtering은 높은 증착률을 가지고 있으며, 증착된 박막의 특성도 우수하다고 알려져 있다. 본 연구에서는 최대 출력 700 V, 12.5 A, 100 kHz)의 사양을 가지는 DC, pulse DC, modulated pulsed DC의 세 종류로 변환이 가능한 Power supply를 제작하여 Cr 박막을 증착하였다. 증착시 혼합기체 Ar/$N_2$를 사용하였으며, 박막의 특성을 sputtering power 종류별로 비교 평가하였다. 실험 결과얻어진 박막을 SEM과 XRD를 이용하여 분석하였다.

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Magnetron Sputter내 Plasma 분포 및 Target Erosion Profile 해석

  • 김성구;오재준;신재광;이규상;허재석;이형인;이윤석
    • Proceedings of the Korean Vacuum Society Conference
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    • pp.209-209
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    • 1999
  • 현재 magnetron sputter는 반도체, LCD 등을 포함하는 microelectronics 산업에서 박막형성을 위한 주요 장비로 널리 쓰이고 있으며, 소자의 고집적화 및 대형화 추세에 따라 그 이용가치는 더욱 증대되고 있다. 본 연구엣는 TFT-LCD용 Color Filter 제조시 ITO박막형성을 위해 사용하는 magnetron sputter 내부의 플라즈마 분포 및 ion kinetic energy에 대한 해석을 실시하였으며, ITO target의 erosion 형상의 원인을 실험결과와 비교하였다. Magnetron sputtering은 target에 가해지는 bias 전압(DC 혹은 RF)에 의해 target과 shield 혹은 target과 substrate 사이에서 생성될 수 잇는 플라즈마를 target 및 부분에 붙어있는 영구자석을 이용하여 target 근처에 집중시키고, target 표면과 플라즈마 사이의 전위차에 의해 가속된 이온들이 target 표면과 충돌하여 이차 전자방출을 일으킴과 동시에 target 표면에서 sputtering을 일으키고, 이들 sputtered 된 중성의 atom 들이 substrate로 날아가 박막을 형성하는 원리로 작동된다. 이때 target에서 방출되는 이차전자들은 영구자석에 의한 자기장 효과에 의해 target 근처에 갇히게 되어 중성 기체분자들과 이온화반응을 통해 플라즈마를 유지하고 그 밀도를 높혀주는 역할을 담당하게 된다. 즉 낮은 압력 및 bias 전압에서도 플라즈마 밀도를 높일수 있고 sputtering 공정이 가능한 장점을 가지고 있다. Magnetron sputtering 현상에 대한 시뮬레이션은 크게 magnetron discharge와 sputtering에 대한 해석 두가지로 나누어 볼 수 있는데, sputtering 현상 자체를 수치묘사할 수 있는 정량적인 모델은 아직까지 명확하게 정립되어 있지 않다. 따라서 본 연구에서는 magnetron plasma 자체에 대한 수치해석에 주안점을 두고 아울러 bulk plasma 영역에서 target으로 입사하는 이온들의 입사에너지 및 입사각도 등을 Monte Carlo 방법으로 추적하여 sputtering 현상을 유추해보았다. Sputtering 현상을 살펴보기 위해 magnetron sputter 내 플라즈마 밀도, 전자온도, 특히 target 및 substrate를 충돌하는 이온의 입사에너지 및 입사각 분포등을 계산하는데 hybrid 방법으로 시뮬레이션을 하였다. 즉 ion과 bulk electron에 대해서는 fluid 방식으로 접근하고, 이차전자 운동과 그로 인한 반응관계 및 target으로 입사하는 이온의 에너지와 입사각 분포는 Monte-Carlo 방법으로 처리하였다. 정지기장해석의 경우 상용 S/W인 Vector Fields를 사용하였다. 이를 통해 sputter 내 플라즈마 특성, target으로 입사하는 이온에너지 및 각 분포, 이들이 target erosion 형상에 미치는 영향을 살펴보았다. 또한 이들 결과로부터 간단한 sputtering 모델을 사용하여 target으로부터 sputter된 입자들이 substrate에 부착되는 현상을 Monte-Carlo 방법으로 추적하여 성막특성도 살펴보았다.

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The effect of electrical properties by gas ratio on $Bi_{3.25}La_{0.75}Ti_3O_{12}$ thin films deposited by RF magnetron sputtering during being annealed (RF magnetron sputtering으로 제작한 BLT 박막의 후열처리 시 가스비 변화에 따른 전기적 특성에 관한 연구)

  • Lee, Kyu-Il;Kim, Eung-Kwon;Kang, Hyun-Il;Song, Joon-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • pp.49-52
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    • 2003
  • The role of gas ratio with the crystallization behavior and electrical properties in $Bi_{3.25}La_{0.75}Ti_3O_{12}$(BLT) thin films by rf magnetron sputtering method has not been precisely defined. In this work, the ferroelectric properties of these films with gas variation was investigated. BLT thin films were deposited on the Pt/Ti bottom electrode by rf magnetron sputtering method and then they were crystallized by rapid thermal annealing (RTA). The experiment showed that all BLT films indicated perovskite polycrystalline structure with preferred orientation (020) and (0012). And no pyrochlore phase was observed. The fabricated film annealed with $O_2$ of 15 sccm showed that value of leakage current was $9.67{\times}10^{-7}A/cm^2$ at 50kV /em, and the value of remanent polarization (2Pr=Pr+-Pr-) was $11.8{\mu}C/cm^2$. Therefore we induce access to memory device application by rf-magnetron sputtering method in this report.

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