• Title, Summary, Keyword: Photosensitivity

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PHOTOSENSITIVITY OF HETEROJUNCTION TYPE GRAINS IN CUBIC SILVER HALIDE MICROCRYSTALS

  • Park, In Yeong
    • Journal of Photoscience
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    • v.3 no.3
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    • pp.159-161
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    • 1996
  • Photosensitivity of silver halide emulsion depends on the properties of the microcrystals. Size, shape, grain distribution and chemical composition as well as the inner structure or the topography of the latent image specks affect on the optical properties and play an important role in the photographic process. In the present paper, a study on the sensitization of emulsion containing AgBrClI core/shell grains showed that for the given size, shape, halide content and crystal habit, under the optimal conditions the photosensitivity of the heterojunction type grains are different from that of the common regular grains. The optimal photosensitivity was obtained at the iodide content of 2.0 mo1%.

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Effect of Aromatic Acid Amplifier, 2-hydroxy-2'-tosyloxy Biphenyl, on the kind of Resist Resins (방향족 산증식제 2-hydroxy-2'-tosyloxy Biphenyl의 레지스트 레진의 종류에 따른 효과에 관한 연구)

  • Kang, Ji-Eun;Jeong, Yong-Seok;Jeong, Yeon-Tae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.6
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    • pp.499-505
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    • 2005
  • We compared the effects of a representative aromatic acid amplifier, 2-hydroxy-2'-tosylory biphenyl, doped in poly(tort-butyl methacrylate) (PTBMA), poly (tetrahydropyranylmethacrylate) (pTHPMh) or poly[tert-butoxycarbonyloxystyrene) (pTBOCST) resin film as acid labile polymer in view of thermal stability and photosensitivity enhancement. The acid amplifier was stable up to 60 min in pTBMA and pTBOCST film and up to 10 min in pTHPMA film at $120^{\circ}C$. pTBMA and pTHPMA film doped with the acid amplifier showed 9 times and 3 times higher photosensitivity, respectively. But pTBOCST film showed a negligible photosensitivity enhancement. Photosensitivity enhancement and thermal stability of the acid amplifier were found to be affected by the resin.

Study on the Out-of-Plane Deformation Measurement Condition through Comparison Photosensitivity (광감도 비교를 통한 면외 변형 측정 조건에 대한 연구)

  • Kim, Hyun Ho;Kang, Chan Geun;Lee, Hyun Jun;Jung, Hyun Chul;Kim, Kyeong Suk;Hong, Chung Ki
    • Journal of the Korean Society for Precision Engineering
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    • v.32 no.9
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    • pp.807-813
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    • 2015
  • In the present study, an interferometer system, which integrates the laser sensitivity control technique based on the theory of electronic speckle pattern interferometry, one of non-contact non-destructive analysis methods, was developed. This interferometry system receives an image from CCD cameras for each reference and object, and compares the photosensitivity of the object and reference images from imagification. For the purpose of this study, the photosensitivity of object and reference light is measured with power meters, and the amount of light was controlled with an ND filter with a reference light port matching photosensitivity. Using the plate specimen as the object, 0.6, 0.9, 1.2, and $1.5{\mu}m$ of out-plane deformation was made, and images were compared according to the difference in photosensitivity. After analysis, larger object deformations showed larger numbers of stripe patterns. Images became clearer and data error was reduced when the photosensitivity of object and reference light matched.

Effect of Photopolymerization on the Rate of Photocrosslink in Chalcone-based Oligomeric Compounds

  • Choe, Dong Hun;O, Sang Jun;Ban, Si Yeong;O, Gwang Yong
    • Bulletin of the Korean Chemical Society
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    • v.22 no.11
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    • pp.1207-1212
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    • 2001
  • A new photochemically bifunctional epoxy and dimethacrylate compounds were synthesized for investigating the photosensitivity under UV irradiation. Photosensitivity of the synthesized chalcone-based compounds was investigated by using UV-visible absorption and Fourier transformed infrared (FT-IR) spectroscopies. The result of spectroscopic analysis substantiated that the two chalcone-based compounds have functions of both photocrosslinking and photopolymerization by UV exposure in the presence of photoinitiator. Two kinds of photochemical reactions proceeded competitively during UV exposure. Particularly, we studied the effect of photopolymerization on the rate of photocrosslink due to cycloaddition in the two oligomeric compounds.

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1-Hydroxy-4-tosyloxy cyclohexane and 1,4-Ditosyloxy cyclohexane as Acid Amplifiers To Enhance the Photosensitivity of Positive-Working Photoresists (포지티브 포토레지스트의 감도 증진을 위한 산증식제로 1-Hydroxy-4-tosyloxy cyclohexane과 1,4-Ditosyloxy cyclohexane에 관한 연구)

  • 정연태;이은주;권경아
    • Journal of the Korean Printing Society
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    • v.20 no.1
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    • pp.91-101
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    • 2002
  • An acid amplifier is defined as an acid-generating agent which is decomposed autocatalytically to produce new strongly acidic molecules in a non-liner manner, The addition of the acid amplifiers to conventional chemically amplified photoresists consisting of photoacid generators and acid-sensitive polymers result in the improvement of photosensitivity due to the amplified generation of catalytic acid molecules as a result of the decomposition of acid amplifiers. We synthesized and evaluated 1-hydroxy-4-tosyloxy cyclohexane(AA-1) and 1,4-ditosyloxy cyclohexane(Ah-2) as novel acid amplifiers. The acid amplifiers(AA-1, AA-2) showed reasonable thermal stability for resist processing temperature. As estimated by the sensitivity curve, tort-butyl methacrylate homopolymer(ptBMA) film doped with AA-1 or 2 exhibited much higher photosensitivity than ptBMA film without AA-1 or 2. And AA-1 showed higher effect than AA-2 on enhancing photosensitivity of ptBMA film.

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Theory of polarization grating formation induced by the photosensitivity in birefringent optical fibers

  • An, Sunghyuck
    • Korean Journal of Optics and Photonics
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    • v.5 no.4
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    • pp.487-492
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    • 1994
  • The two-photon bleaching model is generalized to derive the dynamical equations which describe the polarization grating formation induced by the photosensitivity in birefringent optical fibers. The frequency response of the induced polarization grating is studied numerically and its relation to the material parameter is investigated.

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Development of technology to prevent influence of images upon viewers

  • Morita, Toshiya
    • 한국정보디스플레이학회:학술대회논문집
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    • pp.1131-1134
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    • 2007
  • To prevent biological influence of images upon viewers, we investigated the characteristics features of images and of viewing environments which can cause photosensitivity seizures and visually-induced motion sickness, and developed some methods of detection and conversion of images that can cause such influence.

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Poly[(1-methacryloyloxy-4-tosyloxycyclohexane)-co-(tert-butyl methacrylate)] as an acid amplifying photoresist (산 증식형 포토레지스트로 Poly($MTC_{10}-co-tBMA_{90}$)의 합성 및 특성 연구)

  • Kuen, Kyoung-A;Lee, Eun-Ju;Lim, Kwon-Taek;Jeong, Yong-Seok;Jeong, Yeon-Tae
    • Journal of the Korean Printing Society
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    • v.20 no.2
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    • pp.131-140
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    • 2002
  • Chemically amplified deep UV(CA-DUV) resists are typically based on a combination of an acid labile polymer and a photoacid generator(PAG) but acid amplification type photoresist is formulated by addition of the acid amplifiers to chemically amplified resist system(CAPs). We developed acid amplifiers base on cyclohexanediol such as 1-methacryloyloxy-4-tosyloxy cyclohexane(MTC) and poly(MTC$_{10}$-co-tBMA$_{90}$)(P-1) to enhance photosensitivity. P-1 is a copolymer of tert-butyl methacrylate and MTC as a positive working photoresist based on polymeric acid amplifier in order to enhance photosensitivity and simplify the process of fomulating a photoresist. P-1 exhibited 2X higher photosensitivity compared with PtBMA. The acid amplifiers showed reasonable thermal stability for resist processing temperature and higher photosensitivity compared with chemically amplified resist.

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Effect of Boron Concentration on the UV Photosensitivity of Silica Glass Film for Planar Lightwave Circuit (Boron 첨가량이 평면광회로용 실리카 박막의 UV 감광성에 미치는 영향)

  • Kwon Ki Youl;Cho Seung-Hyun;Shin Dong Wook;Song Kug-Hyun;Lee Nak Kyu;Na Kyoung Hwan
    • Journal of the Korean Ceramic Society
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    • v.41 no.11
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    • pp.826-833
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    • 2004
  • In this study, photosensitivity dynamics in SiO$_2$ glass with the composition similar to that of silica Planar Lightwave Circuit (PLC) devices was investigated as a fundamental study prior to the device fabrication. Silica bulk glasses with similar composition to the core layer of PLC devices were prepared with variable composition of B$_2$O$_3$. The photosensitivity in boron and germanium co-doped SiO$_2$ glass yields refractive index change $\Delta$n as high as 10$\^$-3/. However such index modulation disappeared after annealing. From the result of annealing experiment and W absorption / Raman spectra, we conclude the compaction model is applicable to our glass system.

Effect of Acid Amplifier, 4-Hydroxy-4'-p-tosyloxy Isopropylidene Dicyclohexane, on the Kind of Resin in Chemically Amplified Photoresist (화학 증폭형 포토레지스트 수지의 종류에 따른 산증식제 4-Hydroxy-4'-p-tosyloxy Isopropylidene Dicyclohexane의 효과)

  • Kang, Ji Eun;Lim, Kwon Taek;Jeong, Yeon Tae
    • Applied Chemistry for Engineering
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    • v.16 no.2
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    • pp.262-266
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    • 2005
  • We compared the effects of a representative aliphatic acid amplifier, 4-hydroxy-4'-p-tosyloxy isopropylidene dicyclohexane, doped in poly[tert-butyl methacrylate] (pTBMA), poly[tetrahydropyranyl methacrylate] (pTHPMA) or poly[tert-butoxycarbonyloxystyrene] (pTBOCST) resin film as acid labile polymer in view of thermal stability and photosensitivity enhancement. The acid amplifier was stable up to 20 min in pTBMA and pTBOCST film and up to 5 min in pTHPMA film at $120^{\circ}C$. pTBMA and pTHPMA films doped with the acid amplifier showed four times and two times higher photosensitivity, respectively. But pTBOCST showed negligible photosensitivity enhancement. Photosensitivity enhancement and thermal stability were found to be affected by the resin.