• Title, Summary, Keyword: SU-8 포토레지스트

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Fabrication of Micro-channels for Wave-Micropump Using Stereolithography and UV Photolithography (광조형법과 UV 포토리소그래피를 이용한 웨이브 마이크로펌프 미세 채널 제작)

  • Loh, Byoung-Gook;Kim, Woo-Sik;Shim, Kwang-Bo
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.12
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    • pp.128-135
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    • 2007
  • Micro-channels for a wave micropump have been fabricated using the Stereolithography and UV Photolithography. The micro-channel with a channel height of $500\;{\mu}m$ was fabricated with stereolithography. UV photolithography was used for producing micro-channels with a channel length less than $100\;{\mu}m$. The fabrication process data including spinning rpm, pre-bake and post-bake time, and develop time for single layer and multiple layer 3D micro-structures using SU-8 photo resist are experimentally found. A film mask printed with a 40,000 dpi laser printer was used for UV lithography and micro-structures in the order of tens of micrometers in dimension were successfully fabricated.

Statistical Characterization and Optimization of SU-8 Photoresist Processing by Response Surface Methodology (반응표면분석을 통한 SU-8 포토레지스트의 특성 및 최적화)

  • Mun, Sei-Young;Kim, Gwang-Beom;Soh, Dae-Wha;Hong, Sang-Jeen
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • v.9 no.2
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    • pp.891-894
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    • 2005
  • SU-8은 부드러운 벽면을 가지는 두꺼운 패턴을 제작하는 데 사용되는 음성 감광제(negative photoresist)이다 .이것은 처리 후에 강성이 높고 화학적으로 강인한 장점을 가지고 있으며 최근 MEMS 디바이스의 구조체로 쓰이고 있다. 그러나 SU-8은 공정 처리요소들에 대하여 매우 민감하고 사용하기 어려운 것으로 알려져 있다. 본 연구에서는 공정 처리요소로 exposure energy, post exposure bake (PEB) temperature, PEB time을 조절하여 실험을 하였다. Response Surface Methodology (RSM)를 이용해 각 인자가 delamination에 미치는 영향에 대해 분석하였고 이를 바탕으로 SU-8의 delamination을 최소화하기 위한 처리요소들의 최적화 방안을 제시하였다.

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A Study on the Ablation of AZ5214 and SU-8 Photoresist Processed by 355nm UV Laser (355nm UV 레이저를 이용한 AZ5214와 SU-8 포토레지스트 어블레이션에 관한 연구)

  • Oh, J.Y.;Shin, B.S.;Kim, H.S.
    • Journal of Korean Society of Laser Processing
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    • v.10 no.2
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    • pp.17-24
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    • 2007
  • We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with $F-{\theta}$ lens. AZ5214 and SU-8 photoresist are chosen as experimental materials and a kind of well-known positive and negative photoresist respectively. Laser ablation mechanism depends on the optical properties of polymer. In this paper, therefore we investigate the phenomenon of laser ablation according to the laser fluence variation and measure the shape profile of micro patterned holes. From these experimental results, we show that LDWL is very useful to process various micro patterns directly.

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Fabrication of EHD(Electrohydrodynamic) nozzle using surface hydrophobic coating and SU-8 photoresist (SU-8 포토레지스트와 표면 소수처리를 이용한 전기 수력학 노즐 제작)

  • Lim, Byung-Jik;Lee, Kyoung-Il;Kim, Seong-Hyun;Kim, Seon-Min;Lee, Churl-Seung;Lee, Hyun-Joo;Byun, Sang-Un;Cho, Jin-Woo
    • Proceedings of the KIEE Conference
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    • pp.1706-1707
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    • 2011
  • SU-8 감광제를 이용하여 전기 수력학에 응용할 수 있는 내경 $50{\mu}m$인 평면형 노즐 구조와 외경 $100{\mu}m$, 내경 $50{\mu}m$인 돌출형 노즐 구조를 제작하고 노즐 표면에 불소계 수지를 건식 증착하여 소수 처리를 하였으며 이를 통해 전기수력학 방식의 잉크 토출을 구현하였다.

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Experimental and Finite Element Study of Tribological Characteristics of SU-8 Thin Film (실험 및 유한요소해석에 의한 SU-8 박막의 Tribological 특성 연구)

  • Yang, Woo Yul;Shin, Myounggeun;Kim, Hyung Man;Han, Sangchul;Sung, In-Ha
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.37 no.4
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    • pp.467-473
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    • 2013
  • In this study, two-dimensional finite element models were developed and experiments were conducted using an atomic force microscope to investigate the tribological characteristics of an SU-8 layer coated on a patterned wafer for microsystem applications. The results revealed that both the adhesion and the friction forces measured by the atomic force microscope were lower for the SU-8 coated surface than for the bare silicon surface. This is attributed to the hydrophobicity of SU-8. Another important result derived from the finite element analysis was the critical load required to fracture the SU-8 film with respect to the thickness. The critical loads for thicknesses of 200, 400, and 800 nm were approximately 13, 22, and 28 mN, respectively, which corresponded to a Hertzian contact pressure of 1.2-1.8 GPa. These results will aid in the design of a suitable SU-8 thickness for microsystem components that are in contact with one another.