• Title, Summary, Keyword: Scanning Electron Microscope

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Design and Manufacture of an Electron Detector for Scanning Electron Microscope (주사전자현미경용 전자검출기의 설계 및 제작)

  • Jeon, Jong-Up;Kim, Ji-Won
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.4
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    • pp.53-60
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    • 2008
  • Electron detectors used in scanning electron microscope accept electrons emitted from the specimen and convert them to an electrical signal that, after amplification, is used to modulate the gray-level intensities on a cathode ray tube, producing an image of the specimen. Electron detector is one of the key components dominating the performance of scanning electron microscope so that the development of electron detectors having high performance is indispensable to acquire high quality images using scanning electron microscope. In this paper, we designed and manufactured an electron detector and conducted a couple of image capture experiments using it. In particular, scintillator which generates light photons when it is struck by high-energy electrons was manufactured and experimental studies on the optimization of manufacturing condition was carried out. From experiments to evaluate the performance of our detector, it was verified that the performance of our detector is equivalent to or better than that of the conventional one.

Applications of the Scanning Electron Microscope (주사형(走査型) 전자현미경(電子顯微鏡)의 응용분야(應用分野))

  • Kim, Yong-Nak
    • Applied Microscopy
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    • v.2 no.1
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    • pp.39-46
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    • 1972
  • There are many kinds of microscopes suitable for general studies; optical microscopes(OM), conventional transmission electron microscopes (TEM), and scanning electron microscopes(SEM). The optical microscopes and the conventional transmission electron microscopes are very familiar. The images of these microscopes are directly formed on an image plane with one or more image forming lenses. On the other hand, the image of the scanning electron microscope is formed on a fluorescent screen of a cathode ray tube using a scanning system similar to television technique. In this paper, the features and some applications of the scanning electron microscope will be discussed briefly. The recently available scanning electron microscope, combining a resolution of about $200{\AA}$ with great depth of field, is favorable when compared to the replica technique. It avoids the problem of specimen damage and the introduction of artifacts. In addition, it permits the examination of many samples that can not be replicated, and provides a broader range of information. The scanning electron microscope has found application in diverse fields of study including biology, chemistry, materials science, semiconductor technology, and many others. In scanning electron microscopy, the secondary electron method. the backscattererd electron method, and the electromotive force method are most widely used, and the transmitted electron method will become more useful. Change-over of magnification can be easily done by controlling the scanning width of the electron probe. It is possible. to continuously vary the magnification over the range from 100 times to 1.00,000 times without readjustment of focusing. Conclusion: With the development of a scanning. electron microscope, it is now possible to observe almost all-information produced through interactions between substances and electrons in the form of image. When the probe is properly focused on the specimen, changing magnification of specimen orientation does not require any change in focus. This is quite different from the conventional transmission electron microscope. It is worthwhile to note that the typical probe currents of $10^{-10}$ to $10^{-12}\;{\AA}$ are for below the $10^{-5}$ to $10^{-7}\;{\AA}$ of a conventional. transmission microscope. This reduces specimen contamination and specimen damage due to heatings. Outstanding features of the scanning electron microscope include the 'stereoscopic observation of a bulky or fiber specimen in high resolution' and 'observation of potential distribution and electromotive force in semiconductor devices'.

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A Study on the Secondary Electron Detector for use in Scanning Electron Microscope (SEM용 전자 검출기의 설계 및 제작)

  • Lee SangUk;Jeon Jong Up;Park KiTae;Park Kyu Yeol
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • pp.9-14
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    • 2005
  • The nature of the signals collected by an SEM(Scanning Electron Microscope) in order to form images are all dependent on the detector used to collect them, and the quality of an acquired image is strongly influenced by detector performance. Therefore, the development of detector with high performance is very important in pulling up the resolution of SEM This study presents the secondary electron detector for use in scanning electron microscope, electric circuit and I/V conversion circuit for driving that detector.

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Analysis of Ceramics Using Scanning Electron Microscopy (주사전자현미경을 활용한 세라믹의 분석)

  • Lee, Sujeong
    • Ceramist
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    • v.22 no.4
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    • pp.368-380
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    • 2019
  • A ceramic is used as a key material in various fields. Accordingly, the use of scanning electron microscopy is increased for the purpose of evaluating the reliability and defects of advanced ceramic materials. The scanning electron microscope is developed to overcome the limitations of optical microscopy and uses accelerated electrons for imaging. Various signals such as SE, BSE and characteristic X-rays provide useful information about the surface microstructure of specimens and, the content and distribution of chemical components. The development of electron guns, such as FEG, and the improved lens system combined with the advanced in-lens detectors and STEM-in-SEM system have expanded the applications of SEM. Automated SEM-EDS analysis also greatly increases the amount of data, enabling more statistically reliable results. In addition, X-ray CT, XRF, and WDS, which are installed in scanning electron microscope, have transformed SEM a more versatile analytical equipment. The performance and specifications of the scanning electron microscope to evaluate ceramics were reviewed and the selection criteria for SEM analysis were described.

Establishment of Gun Head Unit for Electron Beam Machining System (전자빔건 헤드유니트의 설계와 제작)

  • Kang J.H.;Lee C.H.;Choi J.H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • pp.1875-1878
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    • 2005
  • It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with electron beam gun head unit is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included ceramic isolation plate and main body which are essentially constructed for electron beam gun head unit are designed and manufactured. And this electron beam gun head unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

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Neural Network Recognition of Scanning Electron Microscope Image for Plasma Diagnosis (플라즈마 진단을 위한 Scanning Electron Microscope Image의 신경망 인식 모델)

  • Ko, Woo-Ram;Kim, Byung-Whan
    • Proceedings of the KIEE Conference
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    • pp.132-134
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    • 2006
  • To improve equipment throughput and device yield, a malfunction in plasma equipment should be accurately diagnosed. A recognition model for plasma diagnosis was constructed by applying neural network to scanning electron microscope (SEM) image of plasma-etched patterns. The experimental data were collected from a plasma etching of tungsten thin films. Faults in plasma were generated by simulating a variation in process parameters. Feature vectors were obtained by applying direct and wavelet techniques to SEM Images. The wavelet techniques generated three feature vectors composed of detailed components. The diagnosis models constructed were evaluated in terms of the recognition accuracy. The direct technique yielded much smaller recognition accuracy with respect to the wavelet technique. The improvement was about 82%. This demonstrates that the direct method is more effective in constructing a neural network model of SEM profile information.

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The Electron Detector in Scanning Electron Microscope (주사전자현미경용 전자검출기)

  • 이상욱;전종업;한상훈
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • pp.513-517
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    • 2004
  • The nature of the signals collected by an SEM(Scanning Electron Microscope) in order to form images are all dependent on the detector used to collect them, and the quality of an acquired image is strongly influenced by detector performance. Therefore, the development of detector with high performance is very important in pulling up the resolution of SEM. In this article, electron beam-specimen interactions, the detection principle of secondary electrons and backscattered electrons, and the structure of a conventional detector are described. The structure of an experimental apparatus for the future study on our hopeful novel electron detector is presented as well.

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Establishment of Column Unit for Electron Beam Machining System (전자빔 가공시스템용 경통의 구축)

  • 강재훈;이찬홍;최종호
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • pp.1017-1020
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    • 2004
  • It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with several electo-magnetic lens is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included several electro-magnetic lens and main body which are essentially constructed for column unit are designed and manufactured. And this established column unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

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An Optimized Methodology to Observe Internal Microstructures of Aloe vera by Cryo-Scanning Electron Microscope

  • Choi, Yoon Mi;Shin, Da Hye;Kim, Chong-Hyeak
    • Applied Microscopy
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    • v.46 no.2
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    • pp.76-82
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    • 2016
  • Aloe vera has been used in the pharmaceutical, food and cosmetic industry for its therapeutic properties. However, there are not many current studies on the microstructure of A. vera compared to studies on the chemical constituents and health efficacy of A. vera. Therefore, we compared the morphology of an A. vera leaf using an optical microscope, a conventional scanning electron microscope (SEM) and a cryo-SEM. Especially, this study focused on observing the gel in the inner leaf of A. vera, which is challenging using standard imaging techniques. We found that cryo-SEM is most suitable method for the observation of highly hydrated biomaterials such as A. vera without removing moisture in samples. In addition, we found the optimal analytical conditions of cryo-SEM. The sublimation conditions of $-100^{\circ}C$ and 10 minutes possibly enable the surface of the inner leaf of A. vera to be observed in their "near life-like" state with retaining moisture. The experiment was repeated with A. arborescens and A. saponaria to confirm the feasibility of the conditions. The results of this study can be applied towards the basic research of aloe and further extend previous knowledge about the surface structures of the various succulent plants.

Relationship of the Distribution Thickness of Dielectric Layer on the Nano-Tip Apex and Distribution of Emitted Electrons

  • Al-Qudah, Ala'a M.;Mousa, Marwan S.
    • Applied Microscopy
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    • v.46 no.3
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    • pp.155-159
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    • 2016
  • This paper analyses the relationship between the distribution of a dielectric layer on the apex of a metal field electron emitter and the distribution of electron emission. Emitters were prepared by coating a tungsten emitter with a layer of epoxylite resin. A high-resolution scanning electron microscope was used to monitor the emitter profile and measure the coating thickness. Field electron microscope studies of the emission current distribution from these composite emitters (Tungsten-Clark Electromedical Instruments Epoxylite resin [Tungsten/CEI-resin emitter]) have been carried out. Two forms of image have been observed: bright single-spot images, thought to be associated with a smooth substrate and a uniform dielectric layer; and multi-spot images, though to be associated with irregularity in the substrate or the dielectric layer.