Pyrosol 법에 의한 $SnO_2$ : F 박막의 전기적 광학적 특성

Electrical and Optical Properties of $SnO_2$ : F Thin Films by Pyrosol Method

A new technique is described for developing low-cost $SnO_2$ : F thin films as TCO (Transparent Conducting Oxide) substrate of a-Si solar cells. A novel Pyrosol equipment has been developed, and $SnO_2$ : F thin films have been deposited under the condition of varing dopant concentration, temperature and composition rate of solution. Futhermore, electrical and optical properties of thin films have been measured, and exhibit resistivity of $4.3{\times}10^{-4}{\Omega}$ cm and transmittance of 80% which is almost at the same level as those of $SnO_2$ : F thin films by CVD.