Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1991.07a
- /
- Pages.244-246
- /
- 1991
Deposition Ratio of Stearic Acid Lagmuir-Blodgett (LB) Films
Stearic Acid Langmuir-Blodgett (LB) 막의 누적비
- Choi, Yong-Sung (Dept. of Electrical Eng., Dong-A University) ;
- Lee, Dae-Il (Dept. of Electrical Eng., Dong-A University) ;
-
Kwon, Young-Soo
(Dept. of Electrical Eng., Dong-A University)
;
- Hong, Eon-Sik (Dept. of Electron & Computer Eng., Hongik University) ;
- Kang, Dou-Yol (Electrical & Control Eng., Hongik University)
- 최용성 (동아대학교 전기공학과) ;
- 이대일 (동아대학교 전기공학과) ;
-
권영수
(동아대학교 전기공학과)
;
- 홍언식 (홍익대학교 전자전산기공학과) ;
- 강도열 (홍익대학교 전기.제어공학과)
- Published : 1991.07.18
Abstract
Recently, a study on LB ultra thin film of molecular size is widely performed. To make use of LB ultra thin film in engineering applications, it is important to investigate how uniformly Langmuir film is deposited on a substrate. In this paper, to confirm the uniformity of film deposition, the relation between the monolayer numbers deposited and its ratio is investigated by deposition of the Y type and Hetero type LB film. If films are deposited ideally, the deposition ratio will become 1.0. From the experimental results, it can be suggested that the deposition of LB film is done well, as we obtained an approximate value 1.0 by the calculation of deposition ratio of L film area and LB film deposition area.
Keywords