Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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$\prod$-A Characteritics of $C_{22}$ Quinolium-(TCNQ) for LB FILM Deposition

$C_{22}$ Quinolium-(TCNQ) LB막 누적을 위한 $\prod$-A 특성

  • 박승규 (홍익대학교 전기제어공학과) ;
  • 김태완 (홍익대학교 물리학과) ;
  • 홍언식 (동아대학교 전기공학과) ;
  • 권영수 (홍익대학교 산업대학교 전산기공학과)
  • Published : 1991.10.01

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Abstract

$\prod$-A characteristics of N-docosylquinolium-TCNQ complex were investigated with the following variations. I> $\prod$-A characteristics with a variation of spreading amount. ii> $\prod$-A characteristics with a variation of barrier speed. iii> $\prod$-A characteristics with a variation of subphase temperature. An optimum surface pressure for a deposition of Langmuir-Blodgett(LB) layer was found to be a 40∼50 mN/m in pure water subphase (pH 5.4, $25^{\circ}C$).

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